Wang Sun , Mengting Yin , Zhongyi Sun , Haibo Liu , Jing Ru , Feng Chen , Haijian Ni , Xinyu Zhao
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引用次数: 0
Abstract
The lack of antibacterial ability in tissue repair materials can lead to repair failure in clinical practice, especially in cases of infection. In this article, an in situ surface modification strategy has been proposed to endow useful biomaterials with excellent antibacterial performance by engineering the surface coordination interaction between iron ions and polyphenols. Through the controlled fabrication of a nanostructured iron gallate (GFe) composite layer on biocompatible silk fibroin microspheres (SFMSs), this study develops an antibiotic-free antimicrobial platform that enables reactive oxygen species (ROS)-mediated bactericidal activity while maintaining the native cell-migration-promoting characteristics of silk fibroin (SF). The resulting biodegradable biomaterial system presents a novel therapeutic strategy for tissue regeneration in infection-prone microenvironments. As a proof-of-concept, silk fibroin microspheres (SFMSs) are selected as the biomaterial matrix and gallic acid (GA) is chosen as the metal ligand materials. The SFMSs are synthesized using a polyvinyl alcohol (PVA) induced β folding method followed by the controlled growth of a layer of the iron gallate nanoparticles (GFe NPs) on its surface, resulting in the formation of GFe NPs modified silk fibroin microspheres (GFe@SFMSs). By harnessing the bacteria-adhesive properties of SF and the reactive oxygen species (ROS) generation catalyzed by Fe3+, GFe@SFMSs are capable of efficiently capturing and eliminating bacteria on their surface. The in vitro bacterial studies have demonstrated that GFe@SFMSs exhibit robust antibacterial activity against both Gram-positive and Gram-negative bacteria. The surface coordination engineering strategy between iron ions and polyphenols presents novel prospects for clinical antibacterial application.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.