{"title":"Ultralow Contact Resistivity of <0.13 Ω · mm for Normal Ti/Al/Ni/Au Ohmic Contact on Non-Recessed i-AlGaN/GaN","authors":"Xiao Wang;Zhiyu Lin;Yumin Zhang;Jianfeng Wang;Ke Xu","doi":"10.1109/TED.2025.3555265","DOIUrl":null,"url":null,"abstract":"By utilizing a traditional Ti/Al/Ni/Au metal stack on i-AlGaN/GaN, we achieved an ultralow contact resistivity of <inline-formula> <tex-math>$\\lt 0.13~\\Omega ~\\cdot $ </tex-math></inline-formula> mm through a combined annealing process, which includes holding at <inline-formula> <tex-math>$550~^{\\circ }$ </tex-math></inline-formula>C for 20 s, followed by a 60-s annealing at <inline-formula> <tex-math>$840~^{\\circ }$ </tex-math></inline-formula>C with an optimized ramp-up rate of <inline-formula> <tex-math>$10~^{\\circ }$ </tex-math></inline-formula>C/s. The formation of TixAlyAuz alloy spikes directly contacting the 2DEG is identified as the primary mechanism for the ultralow contact resistance, which we attribute to the severity of Al transitioning into a molten state during the process.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 5","pages":"2246-2251"},"PeriodicalIF":2.9000,"publicationDate":"2025-04-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10960619/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
By utilizing a traditional Ti/Al/Ni/Au metal stack on i-AlGaN/GaN, we achieved an ultralow contact resistivity of $\lt 0.13~\Omega ~\cdot $ mm through a combined annealing process, which includes holding at $550~^{\circ }$ C for 20 s, followed by a 60-s annealing at $840~^{\circ }$ C with an optimized ramp-up rate of $10~^{\circ }$ C/s. The formation of TixAlyAuz alloy spikes directly contacting the 2DEG is identified as the primary mechanism for the ultralow contact resistance, which we attribute to the severity of Al transitioning into a molten state during the process.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.