Corrigendum to “Understanding dose correction for high-resolution 50 kV electron-beam lithography on thick resist layers” [Micro and Nano Engineering Volume 16, August 2022, 100141]

IF 2.8 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Micro and Nano Engineering Pub Date : 2025-03-01 DOI:10.1016/j.mne.2025.100297

Mattias Åstrand, Thomas Frisk, Hanna Ohlin, Ulrich Vogt

引用次数: 0

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“理解高分辨率50kv电子束光刻在厚抗蚀剂层上的剂量校正”的勘误表[微纳米工程卷16，August 2022, 100141]

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Micro and Nano Engineering Engineering-Electrical and Electronic Engineering

CiteScore

3.30

自引率

0.00%

发文量

审稿时长

80 days