Effects of Cr content on the microstructure of the Cr/A-c coatings and resultant corrosion and electric conductivity

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2025-05-02 DOI:10.1016/j.tsf.2025.140694

Tianyu Sun , Chao Yang , Lan Wang , Dan Dong , Juan Hao , Yongpeng Qiao , Bailing Jiang

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Abstract

In this study, chromium/amorphous carbon (Cr/A-c) coatings with varying Cr doping concentrations were deposited using a magnetron sputtering system equipped with a high-frequency oscillating pulsed electric field. The effects of Cr content on the microstructure, electrical conductivity, and corrosion resistance of the Cr/A-c coatings were systematically investigated. The experimental results revealed that the surface morphology of the Cr/A-c coatings became progressively smoother, with a significant refinement of cluster particles, as the Cr target current increased. Microstructure analysis demonstrated that the coatings consisted of Cr nanocrystals and chromium carbides uniformly dispersed within an amorphous carbon matrix containing both C-sp² and C-sp³ hybridized carbon. With increasing Cr target current, the atomic percentage of Cr in the coatings showed a gradual rise, resulting in a higher density of Cr nanocrystals and chromium carbides. This microstructural evolution led to enhanced electrical conductivity and improved corrosion resistance of the coatings. Optimal performance was achieved at a Cr target current of 0.65 A, where the coating exhibited superior electrical and anti-corrosion properties. Specifically, the interfacial contact resistance (ICR) measured 2.4 mΩ⋅cm² and 1.9 mΩ⋅cm² under compressive pressure of 1.2 × 10⁶ Pa and 1.5 × 10⁶ Pa, respectively, while the corrosion current density reached an exceptionally low value of 1.2 × 10^-6 A/cm².

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Cr含量对Cr/A-c涂层组织及腐蚀性能和电导率的影响

在本研究中，采用配备高频振荡脉冲电场的磁控溅射系统沉积了不同Cr掺杂浓度的铬/非晶碳（Cr/ a -c）涂层。系统研究了Cr含量对Cr/A-c涂层组织、电导率和耐蚀性的影响。实验结果表明，随着Cr靶电流的增大，Cr/ a -c涂层的表面形貌逐渐光滑，簇状颗粒明显细化。微观结构分析表明，涂层由Cr纳米晶和碳化铬组成，均匀分布在含有C-sp2和C-sp3杂化碳的非晶碳基体中。随着Cr靶电流的增大，涂层中Cr的原子率逐渐升高，导致Cr纳米晶和碳化铬的密度增大。这种微观结构的演变提高了涂层的导电性和耐腐蚀性。在Cr目标电流为0.65 a时，涂层表现出优异的电气性能和抗腐蚀性能。其中，在1.2 × 106 Pa和1.5 × 106 Pa压力下，界面接触电阻（ICR）分别为2.4 mΩ⋅cm2和1.9 mΩ⋅cm2，而腐蚀电流密度达到极低的1.2 × 10-6 A/cm2。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.