A low-cost wire grid polarizer with an average extinction ratio of 40 dB in SWIR range realized by oblique angled deposition

IF 4.6 2区物理与天体物理 Q1 OPTICS

Optics and Laser Technology Pub Date : 2025-05-06 DOI:10.1016/j.optlastec.2025.113099

Xingwei Liu, Zefan Lin, Zhehao Zhang, Yuwei Chai, Lingxue Wang, Guoguo Kang

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引用次数: 0

Abstract

Classical metal wire grid polarizers are commonly employed as infrared polarizers due to their broad operating spectrum. However, their low extinction ratio limits applications in high-precision infrared polarization in short-wavelength infrared range. Analysis using the Rigorous Coupled Wave Analysis indicates that the extinction ratio of a metal wire grid polarizer is positively correlated with the depth of the metal grating layer. Traditional etching and lift-off methods are insufficient for achieving the necessary depth to realize a high extinction ratio. In this paper, we propose an approach to fabricate infrared wire grid polarizers with ultra-high extinction ratios by combining Laser Interference Lithography with Oblique Angled Deposition method. The wire grid polarizer has a periodic structure of 300 nm and a grating layer depth of 450 nm, with an aspect ratio of 3:1. Experimental results demonstrate that the average transmission for TM wave exceeds 70 %, while the average extinction ratio surpasses 40 dB (10000:1) within the 1 μm to 2.5 μm range. The wire grid polarizer fabricated using the simple and low-cost methods has the potential to become a commercially viable product.

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采用斜角沉积技术实现了低成本、平均消光比为40 dB的丝栅偏振片

经典金属丝栅偏振器由于其工作光谱宽，通常被用作红外偏振器。然而，它们的低消光比限制了在短波红外范围内高精度红外偏振的应用。采用严格耦合波分析表明，金属丝栅偏振器的消光比与金属光栅层的深度呈正相关。传统的蚀刻和提升方法不足以达到实现高消光比所需的深度。本文提出了一种将激光干涉光刻和斜角沉积相结合的方法来制作超高消光比的红外线栅偏振片。该线栅偏振片具有300 nm的周期结构，光栅层深度为450 nm，宽高比为3:1。实验结果表明，在1 μm ~ 2.5 μm范围内，TM波的平均透射率超过70%，平均消光比超过40 dB（10000:1）。采用简单、低成本的方法制作的线栅偏振片具有成为商业上可行产品的潜力。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Optics and Laser Technology 物理-光学

CiteScore

8.50

自引率

10.00%

发文量

1060

审稿时长

3.4 months

期刊介绍： Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems