Effect of laser shock peening on near-surface residual stress and microstructure of laser additive manufacturing AlSi10Mg alloy

IF 4.6 2区 物理与天体物理 Q1 OPTICS
Shitao Dou , Pengfei Ji , Jin Zhang , Lin Zheng , Fangchao Zhao , Yong Lian , Weisheng Xu , Xin Chen , Linyang Wu , Jie Luo , Jinghan Yang
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Abstract

This study investigates the effects of variations in laser shock peening (LSP) energy on the near-surface residual stress distribution and microstructural evolution of laser additive manufacturing (LAM) AlSi10Mg components, with the aim of evaluating and optimizing LSP processes. Near-surface residual stress was non-destructively tested through an innovative application of the Short Wavelength Characteristic X-ray Diffraction technique (SWXRD). Compressive residual stress predominated within the 2.0 mm thick after LSP, reaching maximum values of −95.9 MPa (15 J) and −103.6 MPa (30 J) at a depth of 0.6 mm, exhibiting a spoon-shaped profile. Surface hardness increased by 24 % (15 J:136 HV) and 35 % (30 J:149 HV) compared to the untreated sample (114 HV), with an affected depth exceeding 2.0 mm. Dislocation density analysis revealed a depth-dependent gradient across specimen cross-sections, with sample S1 (15 J) and S2 (30 J) showing 21 % and 8 % increases, respectively, in near-surface regions compared to untreated S0. Higher LSP energy (30 J) promoted sub-grain formation, leading to a reduction in dislocation density beyond a depth of 0.6 mm. The proportion of low-angle grain boundaries near the 0.36 mm surface exceeds 65 % in both LSP-treated specimens versus approximately 60 % in untreated S0. Surface topography analysis revealed a 2.65-fold increase in Ra value for the S2 (77 nm) compared to the S1 (29 nm). These findings offer valuable parametric optimization guidelines for LSP processing of LAM components that require controlled residual stress fields. The validated SWXRD technique presents a cost-effective method for industrial near-surface stress analysis.
激光冲击强化对激光增材制造AlSi10Mg合金近表面残余应力和显微组织的影响
本文研究了激光冲击强化(LSP)能量变化对激光增材制造(LAM) AlSi10Mg零件近表面残余应力分布和微观组织演变的影响,旨在评估和优化激光冲击强化工艺。通过短波长特征x射线衍射技术(SWXRD)的创新应用,对近表面残余应力进行了无损检测。残余压应力在2.0 mm内占主导地位,在0.6 mm深度处达到最大值,分别为- 95.9 MPa (15 J)和- 103.6 MPa (30 J),呈勺形分布。与未经处理的样品(114 HV)相比,表面硬度增加了24% (15 J:136 HV)和35% (30 J:149 HV),受影响的深度超过2.0 mm。位错密度分析显示,与未经处理的S0相比,样品S1 (15 J)和S2 (30 J)在近表面区域分别增加了21%和8%。较高的LSP能量(30 J)促进了亚晶的形成,导致位错密度降低到0.6 mm深度以上。在经过lsp处理的试样中,0.36 mm表面附近的低角度晶界比例超过65%,而在未经处理的S0中,这一比例约为60%。表面形貌分析表明,与S1 (29 nm)相比,S2 (77 nm)的Ra值增加了2.65倍。这些发现为需要控制残余应力场的LAM部件的LSP处理提供了有价值的参数优化指导。经过验证的SWXRD技术为工业近表面应力分析提供了一种经济有效的方法。
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来源期刊
CiteScore
8.50
自引率
10.00%
发文量
1060
审稿时长
3.4 months
期刊介绍: Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems
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