A 0.035°/h Quad-Mass Gyroscope With an Initial Frequency Difference Operating Under Mode Matching

IF 4.1 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Bo Jiang;Zhuolin Yu;Jing Zhang;Chen Lin;Yan Su
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引用次数: 0

Abstract

For MEMS (Micro-Electromechanical System) Coriolis vibrating gyroscopes, mode matching provides exceptionally high mechanical sensitivity. Typically, mode-matching gyroscopes require a completely symmetrical structure, resulting in two identical degenerate modes from a dynamics perspective. However, this requirement imposes strict demands on manufacturing precision. This letter introduces a quad-mass gyroscope with an initial frequency split, which relaxes the symmetry requirements of the micro-manufacturing process while maintaining high performance. The proposed design features an ultra-strong, quasi-linear tuning capability achieved through bias voltage and a differentiated design for the drive and readout comb capacitors. These innovations minimize mechanical noise and maximize capacitive gain sensitivity. Additionally, direct current bias voltage is applied to suppress quadrature errors caused by torsional stiffness. This state-of-the-art design achieves a low-noise, low-demodulation-error quad-mass gyroscope, capable of detecting angular rate thresholds as low as 0.001°/s. Experimental results demonstrate a bias instability of 0.035°/h, as indicated by the Allan variance curve, and an angular random walk noise of 0.0093°/ $\surd $ h. Beyond its superior performance, this design effectively mitigates micromachining process imperfections, making it highly suitable for mass production.
一种在模式匹配下工作的初始频差0.035°/h四质量陀螺仪
对于MEMS(微机电系统)科里奥利振动陀螺仪,模式匹配提供了非常高的机械灵敏度。通常,模式匹配陀螺仪需要一个完全对称的结构,从动力学的角度来看,导致两个相同的退化模式。然而,这一要求对制造精度提出了严格的要求。本文介绍了一种具有初始分频的四质量陀螺仪,它在保持高性能的同时放松了微制造过程的对称性要求。提出的设计具有超强的准线性调谐能力,通过偏置电压和驱动和读出梳状电容器的差异化设计实现。这些创新最大限度地减少了机械噪声和最大限度地提高了电容增益灵敏度。另外,采用直流偏置电压抑制由扭转刚度引起的正交误差。这种最先进的设计实现了低噪声,低解调误差的四质量陀螺仪,能够检测低至0.001°/s的角速率阈值。实验结果表明,Allan方差曲线显示偏差不稳定性为0.035°/h,角度随机漫步噪声为0.0093°/ $\surd $ h。除了其优越的性能外,该设计有效地减轻了微加工工艺缺陷,使其非常适合批量生产。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Electron Device Letters
IEEE Electron Device Letters 工程技术-工程:电子与电气
CiteScore
8.20
自引率
10.20%
发文量
551
审稿时长
1.4 months
期刊介绍: IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.
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