Interfacial roughness study of N2 reactive sputtered Ti/Ni neutron supermirrors by neutron reflection technique

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Yue Zhang , Xinxi Li , Qian Qiu , Zhong Zhang , Bo Dai , Yong Ren
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Abstract

Neutron supermirror is an important neutron optics component which uses the total reflection principle to transport neutron beams. The formation of interface intermetallics and interface roughness with total multilayer thickness limit the neutron reflectivity performance of Ti/Ni multilayers. The interface roughness of multilayer film was optimized by adjusting the ratio of N2 when sputtering the Ni layers, which ultimately guided the preparation of Ti/Ni neutron supermirrors with improved reflectivity. Direct current reactive magnetron sputtered samples were prepared with different N2 ratios. And the surface morphology was studied by atomic force microscope (AFM), which revealed that 10 % N2 inhibited the roughness growth of film by refining grains. The results of interfacial structure observed by neutron reflectivity were consistent with the AFM, that the average interfacial roughness of the film was minimized at 10 % N2 ratio. The magnetization strength measured by vibrating sample magnetometer was affected by the number of bilayers and the N2 ratio of the magnetic material. Finally, the Ni layers were sputtered with 10 % ratio of N2, which resulted in a 2.7 % reflectivity enhancement compared to m = 2 Ti/Ni supermirror with pure Ar in the q range of 0.03–0.04 Å-1.
用中子反射技术研究N2反应溅射Ti/Ni中子超镜的界面粗糙度
中子超镜是利用全反射原理传输中子束的重要中子光学元件。界面金属间化合物的形成和界面粗糙度随多层总厚度的变化限制了Ti/Ni多层膜的中子反射率。在溅射Ni层时,通过调整N2的比例来优化多层膜的界面粗糙度,最终制备出具有更高反射率的Ti/Ni中子超镜。采用不同的氮气配比制备了直流反应磁控溅射样品。原子力显微镜(AFM)观察了膜的表面形貌,发现10%的N2通过细化晶粒抑制了膜的粗糙度增长。中子反射率对界面结构的观察结果与原子力显微镜的结果一致,在氮气比为10%时,膜的平均界面粗糙度最小。振动样品磁强计测量的磁化强度受双层层数和磁性材料的N2比的影响。最后,用10%的氮气溅射Ni层,与纯Ar的m = 2 Ti/Ni超反射镜相比,反射率提高了2.7%,q值在0.03 ~ 0.04 Å-1之间。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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