Agata Jasik, Krzysztof Czuba, Paweł Kozłowski, Iwona Sankowska, Marta Różycka, Maciej Fokt, Krzysztof Chmielewski, Ewa Papis-Polakowska, Adam Łaszcz, Joanna Branas, Krzysztof Hejduk, Krzysztof Bracha, Marek Wzorek, Adam Korczyc, Kazimierz Regiński
{"title":"Demonstration of thermoelectrically cooled MWIR InAs/GaSb focal plane arrays","authors":"Agata Jasik, Krzysztof Czuba, Paweł Kozłowski, Iwona Sankowska, Marta Różycka, Maciej Fokt, Krzysztof Chmielewski, Ewa Papis-Polakowska, Adam Łaszcz, Joanna Branas, Krzysztof Hejduk, Krzysztof Bracha, Marek Wzorek, Adam Korczyc, Kazimierz Regiński","doi":"10.1016/j.mssp.2025.109573","DOIUrl":null,"url":null,"abstract":"<div><div>Thermoelectrically cooled focal plane arrays (FPAs) for the mid-wavelength infrared spectral range have been demonstrated. The mesa-shaped pixels were formed in <em>pin</em> InAs/GaSb heterostructure using dry etching. FPA with 320 × 256 resolution and a pixel pitch of 30 μm was obtained. Indium die-bonding was applied to connect FPA and a read-out integrated circuit. The thermoelectrically cooled hybrid was hermetically sealed in a vacuum housing with a silicon window. The pictures of the hot soldering tip were detected using FPA at different temperatures.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"194 ","pages":"Article 109573"},"PeriodicalIF":4.2000,"publicationDate":"2025-04-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800125003105","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Thermoelectrically cooled focal plane arrays (FPAs) for the mid-wavelength infrared spectral range have been demonstrated. The mesa-shaped pixels were formed in pin InAs/GaSb heterostructure using dry etching. FPA with 320 × 256 resolution and a pixel pitch of 30 μm was obtained. Indium die-bonding was applied to connect FPA and a read-out integrated circuit. The thermoelectrically cooled hybrid was hermetically sealed in a vacuum housing with a silicon window. The pictures of the hot soldering tip were detected using FPA at different temperatures.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.