Analysis of the Voltage Ramp Rate Effects on the Programming Characteristics of Bipolar-Type Memristive Devices

IF 2.1 4区工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC

IEEE Transactions on Nanotechnology Pub Date : 2025-04-02 DOI:10.1109/TNANO.2025.3556856

E. Miranda;E. Piros;F. L. Aguirre;T. Kim;P. Schreyer;J. Gehrunger;T. Schwarz;T. Oster;K. Hofmann;J. Suñé;C. Hochberger;L. Alff

{"title":"Analysis of the Voltage Ramp Rate Effects on the Programming Characteristics of Bipolar-Type Memristive Devices","authors":"E. Miranda;E. Piros;F. L. Aguirre;T. Kim;P. Schreyer;J. Gehrunger;T. Schwarz;T. Oster;K. Hofmann;J. Suñé;C. Hochberger;L. Alff","doi":"10.1109/TNANO.2025.3556856","DOIUrl":null,"url":null,"abstract":"We investigate in this letter the role the voltage ramp rate plays in the conduction and programming characteristics of bipolar-type memristive devices. It is shown that speeding up the writing or erasing process of a memristor is beneficial in terms of energy consumption but has a side cost associated with power dissipation. This happens because of the dynamical aspects of the set and reset transitions which are ultimately dictated by the physics of metal ions and oxygen vacancies migration. It is shown that by adding a constant base voltage to the voltage sweep, shorter programming times can be achieved but no significant impact on the power dissipation-energy consumption relationship is observed. Modeling and simulations are carried out with the aid of the Dynamic Memdiode Model and its implementation in LTspice using the Method of Elementary Solvers. Since the device model parameters and simulation conditions can vary in a wide range, the complete schematics are provided so that the interested readers can test different casuistries by themselves.","PeriodicalId":449,"journal":{"name":"IEEE Transactions on Nanotechnology","volume":"24 ","pages":"205-208"},"PeriodicalIF":2.1000,"publicationDate":"2025-04-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10947287","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Nanotechnology","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10947287/","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

引用次数: 0

Abstract

We investigate in this letter the role the voltage ramp rate plays in the conduction and programming characteristics of bipolar-type memristive devices. It is shown that speeding up the writing or erasing process of a memristor is beneficial in terms of energy consumption but has a side cost associated with power dissipation. This happens because of the dynamical aspects of the set and reset transitions which are ultimately dictated by the physics of metal ions and oxygen vacancies migration. It is shown that by adding a constant base voltage to the voltage sweep, shorter programming times can be achieved but no significant impact on the power dissipation-energy consumption relationship is observed. Modeling and simulations are carried out with the aid of the Dynamic Memdiode Model and its implementation in LTspice using the Method of Elementary Solvers. Since the device model parameters and simulation conditions can vary in a wide range, the complete schematics are provided so that the interested readers can test different casuistries by themselves.

查看原文本刊更多论文

电压斜坡率对双极型记忆器件编程特性的影响分析

我们在这封信中研究了电压斜坡率在双极型记忆器件的传导和编程特性中所起的作用。结果表明，加快忆阻器的写入或擦除过程在能量消耗方面是有益的，但具有与功耗相关的附带成本。这种情况的发生是由于设定和重置转变的动力学方面，最终由金属离子和氧空位迁移的物理特性决定。结果表明，通过在电压扫描中加入一个恒定的基极电压，可以缩短编程时间，但对功耗-能耗关系没有显著影响。利用动态Memdiode模型进行建模和仿真，并利用初等求解方法在LTspice中实现该模型。由于器件模型参数和仿真条件可以在很大范围内变化，因此提供了完整的原理图，以便有兴趣的读者可以自己测试不同的神秘性。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

IEEE Transactions on Nanotechnology 工程技术-材料科学：综合

CiteScore

4.80

自引率

8.30%

发文量

审稿时长

8.3 months

期刊介绍： The IEEE Transactions on Nanotechnology is devoted to the publication of manuscripts of archival value in the general area of nanotechnology, which is rapidly emerging as one of the fastest growing and most promising new technological developments for the next generation and beyond.