An Extremely Low Ripple High-Voltage DC Power Supply System for Depressed Collector Traveling-Wave Tubes

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Mojtaba Ziaoddini;Shahriyar Kaboli
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引用次数: 0

Abstract

This article investigates the impact of isolating transformer stray capacitances on the output voltage ripple of the high-voltage dc power supply system used in depressed collector traveling-wave tubes (TWTs). It is shown that the common-mode (CM) capacitive current from the isolating transformer of the TWT’s depressed collector power supply passes through the output of the TWT’s cathode power supply. Therefore, an additional ripple is generated at the output of the cathode power supply. In high-voltage applications, adding filters to reduce ripple conflicts with the protection considerations of the load and the power supply. This study focuses on reducing this extra voltage ripple without adding new filters. An analysis is presented to demonstrate the relationship between the voltage ripple of the TWT’s cathode power supply and the stray capacitances of the isolating transformer. A transformer winding structure is then proposed to eliminate the CM capacitive current of the collector power supply. Simulation and experimental results show that using the proposed transformer winding structure leads to a 90% voltage ripple amplitude reduction at the cathode power supply output.
一种极低纹波的集电极行波管高压直流供电系统
本文研究了低压集电极行波管中隔离变压器杂散电容对高压直流供电系统输出电压纹波的影响。结果表明,来自行波管降压集电极电源隔离变压器的共模电容电流通过行波管阴极电源的输出。因此,在阴极电源的输出端产生额外的纹波。在高压应用中,增加滤波器以减少纹波冲突与负载和电源的保护考虑。本研究的重点是在不增加新的滤波器的情况下减少这种额外的电压纹波。分析了行波管阴极电源的电压纹波与隔离变压器杂散电容的关系。然后提出了一种变压器绕组结构来消除集电极电源的CM容性电流。仿真和实验结果表明,采用所提出的变压器绕组结构可使阴极电源输出电压纹波幅度降低90%。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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