Yuanyuan He , Pengchao Shen , Yang Liu , Xuefeng He , Quanhua Xie , Yuan Zhou , Mingfu Zhao , Nianbing Zhong
{"title":"MEMS microscope laser scanning for detection of metal artifacts corrosion characteristics","authors":"Yuanyuan He , Pengchao Shen , Yang Liu , Xuefeng He , Quanhua Xie , Yuan Zhou , Mingfu Zhao , Nianbing Zhong","doi":"10.1016/j.measurement.2025.117472","DOIUrl":null,"url":null,"abstract":"<div><div>A novel system for noncontact, nondestructive detection of corrosion in metal artifacts has been developed. It consists of a pulse-modulated laser light source, microelectromechanical system (MEMS) scanning micromirror, optical lens group, photodetector, and field-programmable gate array (FPGA). A theoretical model for assessing corrosion characteristics was established, and the optical path was simulated by LightTools. The system is capable of detecting the reflected light from metal artifact samples treated with various etching agents (H<sub>2</sub>SO<sub>4</sub>, NaOH, MgCl<sub>2</sub>, NaCl, KCl, and water), as well different pH values, temperatures, and humidity levels. Metal corrosion reduce light reflectance on the metal surface, thereby decreasing the light flux received by the photodetector and lowering the system’s output voltage, which facilitates the detection of corrosion. Additionally, scanning voltage identified corrosion behavior, such as edge-initiated corrosion in solutions of varying pH values at 25 ℃. Synchronous corrosion occurred at 45 ℃ in pH = 3.0 sulfuric acid, localized corrosion in droplet and water film formation area at 25 ℃ with 81 % relative humidity. Furthermore, this study compared the proposed method to the standard weight loss method, achieving a maximum relative error of 8.5 %. These results highlight the feasibility of the MEMS laser scanning method for detecting metal artifact corrosion as proposed in this paper.</div></div>","PeriodicalId":18349,"journal":{"name":"Measurement","volume":"253 ","pages":"Article 117472"},"PeriodicalIF":5.6000,"publicationDate":"2025-04-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Measurement","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0263224125008310","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
A novel system for noncontact, nondestructive detection of corrosion in metal artifacts has been developed. It consists of a pulse-modulated laser light source, microelectromechanical system (MEMS) scanning micromirror, optical lens group, photodetector, and field-programmable gate array (FPGA). A theoretical model for assessing corrosion characteristics was established, and the optical path was simulated by LightTools. The system is capable of detecting the reflected light from metal artifact samples treated with various etching agents (H2SO4, NaOH, MgCl2, NaCl, KCl, and water), as well different pH values, temperatures, and humidity levels. Metal corrosion reduce light reflectance on the metal surface, thereby decreasing the light flux received by the photodetector and lowering the system’s output voltage, which facilitates the detection of corrosion. Additionally, scanning voltage identified corrosion behavior, such as edge-initiated corrosion in solutions of varying pH values at 25 ℃. Synchronous corrosion occurred at 45 ℃ in pH = 3.0 sulfuric acid, localized corrosion in droplet and water film formation area at 25 ℃ with 81 % relative humidity. Furthermore, this study compared the proposed method to the standard weight loss method, achieving a maximum relative error of 8.5 %. These results highlight the feasibility of the MEMS laser scanning method for detecting metal artifact corrosion as proposed in this paper.
期刊介绍:
Contributions are invited on novel achievements in all fields of measurement and instrumentation science and technology. Authors are encouraged to submit novel material, whose ultimate goal is an advancement in the state of the art of: measurement and metrology fundamentals, sensors, measurement instruments, measurement and estimation techniques, measurement data processing and fusion algorithms, evaluation procedures and methodologies for plants and industrial processes, performance analysis of systems, processes and algorithms, mathematical models for measurement-oriented purposes, distributed measurement systems in a connected world.