{"title":"High-Speed Ultraviolet Photodetector Based on p-GaN Gate HEMT for Flame Monitoring","authors":"Ercan Yilmaz;Haodong Wang;Emre Doganci;Meixin Feng;Qian Sun;Alex Mutale;Aysegul Kahraman;Umutcan Gurer;Ozan Yilmaz;Azer Sadigov;Farid Ahmadov;Erhan Budak","doi":"10.1109/TED.2025.3539636","DOIUrl":null,"url":null,"abstract":"The p-GaN gate high electron mobility transistor (HEMT) with a <inline-formula> <tex-math>$2.0\\times 10^{-{5}}$ </tex-math></inline-formula> cm2 sensitive area as a UV photodetector (PD) has been designed and fabricated in this study. AlGaN/gallium nitride (GaN) heterostructure was adopted to get a 2-D electron gas (2DEG) as a conductive channel, resulting in a high photoresponsivity of <inline-formula> <tex-math>$8.07\\times 10^{{4}}$ </tex-math></inline-formula> A/W, a sharp cutoff wavelength at 360 nm, high UV-to-visible rejection ratio of <inline-formula> <tex-math>$1.80\\times 10^{{6}}$ </tex-math></inline-formula>, rise and decay time of 0.12 and 1.0 ms, respectively. The dark current of <inline-formula> <tex-math>$5.44\\times 10^{-{7}}$ </tex-math></inline-formula> A, the photocurrent of <inline-formula> <tex-math>$4.42\\times 10^{-{3}}$ </tex-math></inline-formula> A at 5 V, the external quantum efficiency (EQE) of 2.77% <inline-formula> <tex-math>$\\times 10^{{5}}$ </tex-math></inline-formula>%, and the detectivity of <inline-formula> <tex-math>$8.31\\times 10^{{14}}$ </tex-math></inline-formula> Jones for the UV PD were determined under a low UV light intensity of 5 mW/cm2 at 360-nm UV illumination. The obtained results show that the performance of as-fabricated UV PD based on AlGaN/GaN HEMT is significantly improved compared to the literature. This device, which has lower noise equivalent power (NEP) and enhanced detectivity features compared to existing ones, is a promising candidate for military and space applications.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 4","pages":"1993-1999"},"PeriodicalIF":2.9000,"publicationDate":"2025-02-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10891263/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
The p-GaN gate high electron mobility transistor (HEMT) with a $2.0\times 10^{-{5}}$ cm2 sensitive area as a UV photodetector (PD) has been designed and fabricated in this study. AlGaN/gallium nitride (GaN) heterostructure was adopted to get a 2-D electron gas (2DEG) as a conductive channel, resulting in a high photoresponsivity of $8.07\times 10^{{4}}$ A/W, a sharp cutoff wavelength at 360 nm, high UV-to-visible rejection ratio of $1.80\times 10^{{6}}$ , rise and decay time of 0.12 and 1.0 ms, respectively. The dark current of $5.44\times 10^{-{7}}$ A, the photocurrent of $4.42\times 10^{-{3}}$ A at 5 V, the external quantum efficiency (EQE) of 2.77% $\times 10^{{5}}$ %, and the detectivity of $8.31\times 10^{{14}}$ Jones for the UV PD were determined under a low UV light intensity of 5 mW/cm2 at 360-nm UV illumination. The obtained results show that the performance of as-fabricated UV PD based on AlGaN/GaN HEMT is significantly improved compared to the literature. This device, which has lower noise equivalent power (NEP) and enhanced detectivity features compared to existing ones, is a promising candidate for military and space applications.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.