Performance and Reliability Tradeoffs of Power Amplifier Cells Using High-Performance and Medium Breakdown SiGe HBTs

IF 2.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Harrison P. Lee;Nelson E. Sepúlveda-Ramos;Jeffrey W. Teng;John D. Cressler
{"title":"Performance and Reliability Tradeoffs of Power Amplifier Cells Using High-Performance and Medium Breakdown SiGe HBTs","authors":"Harrison P. Lee;Nelson E. Sepúlveda-Ramos;Jeffrey W. Teng;John D. Cressler","doi":"10.1109/TED.2025.3540762","DOIUrl":null,"url":null,"abstract":"In this work, the reliability and performance characteristics of silicon–germanium heterojunction bipolar transistor (SiGe HBT) cascode amplifier cells are investigated. In particular, this study investigates the tradeoffs of using transistors scaled for maximum performance or for increased breakdown voltage in the common-base stage of the cascode. The cascode structures are investigated for their dc operating limits, as well as their small- and large-signal performance, and their electrical reliability. Simulations and measurements are performed to determine how to minimize the performance tradeoffs and maximize the reliability improvement of each device type. It is shown that the difference in peak unity cutoff frequency (<inline-formula> <tex-math>${f}_{T}$ </tex-math></inline-formula>) is much smaller between the high-performance (HP) and medium breakdown (MB) cascodes than for the individual devices, and that biasing the collector–base (CB) device past its base current reversal point further increases <inline-formula> <tex-math>${f}_{T}$ </tex-math></inline-formula> of the cell by 10% or more. Reliability data show that more reliable cascode cell depends on the biasing condition and load line of the cell. Overall, results show that bias and load line can be changed to improve both the performance and reliability of cascode cells.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 4","pages":"1589-1596"},"PeriodicalIF":2.9000,"publicationDate":"2025-02-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10899408/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

In this work, the reliability and performance characteristics of silicon–germanium heterojunction bipolar transistor (SiGe HBT) cascode amplifier cells are investigated. In particular, this study investigates the tradeoffs of using transistors scaled for maximum performance or for increased breakdown voltage in the common-base stage of the cascode. The cascode structures are investigated for their dc operating limits, as well as their small- and large-signal performance, and their electrical reliability. Simulations and measurements are performed to determine how to minimize the performance tradeoffs and maximize the reliability improvement of each device type. It is shown that the difference in peak unity cutoff frequency ( ${f}_{T}$ ) is much smaller between the high-performance (HP) and medium breakdown (MB) cascodes than for the individual devices, and that biasing the collector–base (CB) device past its base current reversal point further increases ${f}_{T}$ of the cell by 10% or more. Reliability data show that more reliable cascode cell depends on the biasing condition and load line of the cell. Overall, results show that bias and load line can be changed to improve both the performance and reliability of cascode cells.
求助全文
约1分钟内获得全文 求助全文
来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信