{"title":"Growth of High-Hole Mobility Stable ST12-Ge Thin Film on Si Substrate for Developing Metal-Oxide–Semiconductor (MOS) Devices","authors":"Subrata Mandal;Sanatan Chattopadhyay;Nabakumar Rana;Aritra Banerjee;Anupam Karmakar","doi":"10.1109/TED.2025.3546933","DOIUrl":null,"url":null,"abstract":"The current work investigates the growth of high-hole mobility ST12-Ge thin film (5.85 nm) on Si substrate for its applications in MOS devices. Micro-Raman study indicates the generation of 3.73 GPa induced compressive stress in such ST12-Ge films and the absorption spectroscopy results confirm a direct bandgap of 0.69 eV and indirect bandgaps of 0.582, 0.634, 0.636, and 0.638 eV. The p-type carrier concentration and room temperature Hall mobility of the film are measured to be <inline-formula> <tex-math>$4.49\\times 10^{{18}}$ </tex-math></inline-formula> cm<inline-formula> <tex-math>$^{-{3}}$ </tex-math></inline-formula> and <inline-formula> <tex-math>$1.33\\times 10^{{4}}$ </tex-math></inline-formula> cm2V<inline-formula> <tex-math>$^{-{1}}$ </tex-math></inline-formula>s<inline-formula> <tex-math>$^{-{1}}$ </tex-math></inline-formula>, respectively. C–V measurements of the fabricated Pt/ZrO2/ST12-Ge/n-Si MOS devices indicate a highly effective dielectric constant of 16.4 for ZrO2 with an effective oxide thickness (EOT) of ~4.09 nm along with the formation of a good ZrO<inline-formula> <tex-math>$_{{2}}{}$ </tex-math></inline-formula>/ST12-Ge interface of trap density <inline-formula> <tex-math>$2.76\\times 10^{{11}}$ </tex-math></inline-formula> cm<inline-formula> <tex-math>$^{-{2}}$ </tex-math></inline-formula>eV<inline-formula> <tex-math>$^{-{1}}$ </tex-math></inline-formula>. The I–V characteristics exhibit a low leakage current density of <inline-formula> <tex-math>$1.57\\times 10^{-{2}}$ </tex-math></inline-formula> A/cm2 at +2 V and an insignificant stress-induced leakage current (SILC) at −5 V for <inline-formula> <tex-math>$10^{{4}}$ </tex-math></inline-formula> s. Therefore, the overall study confirms the formation of a robust ST12-Ge film and ZrO2/ST12-Ge interface, which is suitable for developing CMOS devices with high channel mobility.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 4","pages":"1695-1701"},"PeriodicalIF":2.9000,"publicationDate":"2025-03-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10918679/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
The current work investigates the growth of high-hole mobility ST12-Ge thin film (5.85 nm) on Si substrate for its applications in MOS devices. Micro-Raman study indicates the generation of 3.73 GPa induced compressive stress in such ST12-Ge films and the absorption spectroscopy results confirm a direct bandgap of 0.69 eV and indirect bandgaps of 0.582, 0.634, 0.636, and 0.638 eV. The p-type carrier concentration and room temperature Hall mobility of the film are measured to be $4.49\times 10^{{18}}$ cm$^{-{3}}$ and $1.33\times 10^{{4}}$ cm2V$^{-{1}}$ s$^{-{1}}$ , respectively. C–V measurements of the fabricated Pt/ZrO2/ST12-Ge/n-Si MOS devices indicate a highly effective dielectric constant of 16.4 for ZrO2 with an effective oxide thickness (EOT) of ~4.09 nm along with the formation of a good ZrO$_{{2}}{}$ /ST12-Ge interface of trap density $2.76\times 10^{{11}}$ cm$^{-{2}}$ eV$^{-{1}}$ . The I–V characteristics exhibit a low leakage current density of $1.57\times 10^{-{2}}$ A/cm2 at +2 V and an insignificant stress-induced leakage current (SILC) at −5 V for $10^{{4}}$ s. Therefore, the overall study confirms the formation of a robust ST12-Ge film and ZrO2/ST12-Ge interface, which is suitable for developing CMOS devices with high channel mobility.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.