Investigation of InAlN/GaN Circular Transistors for Venus and Other High-Temperature Applications

IF 2.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Savannah R. Eisner;Yi-Chen Liu;Jared Naphy;Ruiqi Chen;Mina Rais-Zadeh;Debbie G. Senesky
{"title":"Investigation of InAlN/GaN Circular Transistors for Venus and Other High-Temperature Applications","authors":"Savannah R. Eisner;Yi-Chen Liu;Jared Naphy;Ruiqi Chen;Mina Rais-Zadeh;Debbie G. Senesky","doi":"10.1109/TED.2025.3544181","DOIUrl":null,"url":null,"abstract":"This study examines the performance and long-term reliability of depletion-mode In0.18Al0.82/GaN-on-Si circular high electron mobility transistors (C-HEMTs) in high-temperature environments. Transistors were operated at 472 °C in air and 465 °C under simulated Venus conditions (supercritical CO2, 1348 psi) over 5 days. During heating, a reduction in maximum drain current (I<inline-formula> <tex-math>$_{\\textit {D}\\text {,max}}$ </tex-math></inline-formula>) and a positive threshold voltage (VTH) shift are observed in both air and Venus surface conditions. The <sc>ON</small>/<sc>OFF</small> current ratio (I<inline-formula> <tex-math>$_{\\text {ON} }$ </tex-math></inline-formula>/I<inline-formula> <tex-math>$_{\\text {OFF} }$ </tex-math></inline-formula>) and <sc>OFF</small>-state gate leakage current (I<inline-formula> <tex-math>$_{\\textit {G} {, \\text {OFF}}}$ </tex-math></inline-formula>) exhibit unique trends during heating depending on the ambient, yet values upon reaching nominal 468 °C are similar. During the 5-day operation at high-temperature in air, the Mo/Au gate contact demonstrated robust performance with 9% I<inline-formula> <tex-math>$_{\\textit {D}\\text {,max}}$ </tex-math></inline-formula> reduction and 3% VTH shift. I<inline-formula> <tex-math>$_{\\text {ON} }$ </tex-math></inline-formula>/I<inline-formula> <tex-math>$_{\\text {OFF} }$ </tex-math></inline-formula> improved by 8%, and I<inline-formula> <tex-math>$_{\\textit {G} {, \\text {OFF}}}$ </tex-math></inline-formula> decreased by 38%. In comparison, device degradation was more significant in supercritical CO2, where the increased permeability affected the <sc>OFF</small>-state current. The C-HEMT operated in situ Venus surface conditions exhibited 11% reduction in I<inline-formula> <tex-math>$_{\\textit {D}\\text {,max}}$ </tex-math></inline-formula>, 7% VTH shift, 30% reduction in I<inline-formula> <tex-math>$_{\\text {ON} }$ </tex-math></inline-formula>/I<inline-formula> <tex-math>$_{\\text {OFF} }$ </tex-math></inline-formula>, and 23% reduction in I<inline-formula> <tex-math>$_{\\textit {G} {, \\text {OFF}}}$ </tex-math></inline-formula>. Correlation between electrical performance shifts and surface morphology changes, as observed through scanning electron microscopy (SEM) and atomic force microscopy (AFM), provides deeper insights into degradation mechanisms. Despite this, the transistors showed remarkable resilience, and their wide range of available bias points ensures versatile operation for circuit-level implementations in extreme conditions. These findings underscore the suitability of InAlN/GaN HEMTs for uncooled, high-temperature applications without hermetic sealing.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"72 4","pages":"1674-1681"},"PeriodicalIF":2.9000,"publicationDate":"2025-03-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10919467/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0

Abstract

This study examines the performance and long-term reliability of depletion-mode In0.18Al0.82/GaN-on-Si circular high electron mobility transistors (C-HEMTs) in high-temperature environments. Transistors were operated at 472 °C in air and 465 °C under simulated Venus conditions (supercritical CO2, 1348 psi) over 5 days. During heating, a reduction in maximum drain current (I $_{\textit {D}\text {,max}}$ ) and a positive threshold voltage (VTH) shift are observed in both air and Venus surface conditions. The ON/OFF current ratio (I $_{\text {ON} }$ /I $_{\text {OFF} }$ ) and OFF-state gate leakage current (I $_{\textit {G} {, \text {OFF}}}$ ) exhibit unique trends during heating depending on the ambient, yet values upon reaching nominal 468 °C are similar. During the 5-day operation at high-temperature in air, the Mo/Au gate contact demonstrated robust performance with 9% I $_{\textit {D}\text {,max}}$ reduction and 3% VTH shift. I $_{\text {ON} }$ /I $_{\text {OFF} }$ improved by 8%, and I $_{\textit {G} {, \text {OFF}}}$ decreased by 38%. In comparison, device degradation was more significant in supercritical CO2, where the increased permeability affected the OFF-state current. The C-HEMT operated in situ Venus surface conditions exhibited 11% reduction in I $_{\textit {D}\text {,max}}$ , 7% VTH shift, 30% reduction in I $_{\text {ON} }$ /I $_{\text {OFF} }$ , and 23% reduction in I $_{\textit {G} {, \text {OFF}}}$ . Correlation between electrical performance shifts and surface morphology changes, as observed through scanning electron microscopy (SEM) and atomic force microscopy (AFM), provides deeper insights into degradation mechanisms. Despite this, the transistors showed remarkable resilience, and their wide range of available bias points ensures versatile operation for circuit-level implementations in extreme conditions. These findings underscore the suitability of InAlN/GaN HEMTs for uncooled, high-temperature applications without hermetic sealing.
求助全文
约1分钟内获得全文 求助全文
来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信