The parametric design of X-ray ptychography systems

IF 5.2 2区 工程技术 Q1 ENGINEERING, MULTIDISCIPLINARY
Liyang Zhang , Yu Han , Xiaoqi Xi, Chunhui Wang, Lei Li, Mengnan Liu, Qi Zhong, Bin Yan
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引用次数: 0

Abstract

X-ray ptychography improves the illumination method of coherent X-ray diffraction imaging (CDI) by shifting the local illumination area to image large samples, while simultaneously improving the convergence speed and reconstruction quality of phase recovery using the constraints imposed by the overlapping of adjacent illumination areas. To improve the imaging resolution and image quality of X-ray ptychography, system parameters such as ray source parameters, illumination probe size, sample-to-detector transmission distance, detector accuracy, etc. need to be rationalized. Rationalizing the imaging system parameters is even more important when using a laboratory light source with lower brightness and coherence or when the size of the experimental field is limited. In this study, we aim to ensure the high resolution of far-field imaging and explore optimizing the system parameter settings based on a simulation method, focusing on the transmission distance between the sample and the detector. First, we design a simulation method that can flexibly adjust the system parameters to overcome the strict limitation of the matching relationship between parameters in the traditional simulation method. Second, we compare the effects of different overlap rates and up-sampling methods on the imaging results under different transmission distances so that the system can realize high quality far-field ptychography imaging under the shortest possible transmission distance. Finally, the system parameters are adjusted to compare the imaging results under different transmission distances, and the rules for setting the transmission distance under different system parameter designs are proposed.
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来源期刊
Measurement
Measurement 工程技术-工程:综合
CiteScore
10.20
自引率
12.50%
发文量
1589
审稿时长
12.1 months
期刊介绍: Contributions are invited on novel achievements in all fields of measurement and instrumentation science and technology. Authors are encouraged to submit novel material, whose ultimate goal is an advancement in the state of the art of: measurement and metrology fundamentals, sensors, measurement instruments, measurement and estimation techniques, measurement data processing and fusion algorithms, evaluation procedures and methodologies for plants and industrial processes, performance analysis of systems, processes and algorithms, mathematical models for measurement-oriented purposes, distributed measurement systems in a connected world.
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