Machine learning-aided automatic recognition and precise localization of marker layers within multilayer Laue lenses (MLLs) for high-resolution X-ray nanofocusing

IF 4.6 2区物理与天体物理 Q1 OPTICS

Optics and Laser Technology Pub Date : 2025-03-29 DOI:10.1016/j.optlastec.2025.112847

Wei Xu , Weihe Xu , Nathalie Bouet , Juan Zhou , Hanfei Yan , Xiaojing Huang , Zirui Gao , Ming Lu , Yong S. Chu , Evgeny Nazaretski

{"title":"Machine learning-aided automatic recognition and precise localization of marker layers within multilayer Laue lenses (MLLs) for high-resolution X-ray nanofocusing","authors":"Wei Xu , Weihe Xu , Nathalie Bouet , Juan Zhou , Hanfei Yan , Xiaojing Huang , Zirui Gao , Ming Lu , Yong S. Chu , Evgeny Nazaretski","doi":"10.1016/j.optlastec.2025.112847","DOIUrl":null,"url":null,"abstract":"<div><div>We present a new method for the automatic recognition and precise localization of marker layers within multilayer Laue lenses (MLLs) used for high-resolution X-ray nanofocusing. This approach integrates image processing techniques with machine learning algorithms, encompassing multiple stages including marker layer identification, coarse localization, differentiation, fine localization, and profile fitting. By directly obtaining marker layer profiles, this method eliminates errors induced by various factors such as manual measurements and image misalignment. It is robust and effective in the presence of various image defects. The proposed method enhances and streamlines the characterization of MLL optics, enabling accurate assessment of zone placement and detailed multilayer profile analysis. Consequently, it advances the fabrication of MLL optics and improves their application in high-resolution X-ray nanofocusing.</div></div>","PeriodicalId":19511,"journal":{"name":"Optics and Laser Technology","volume":"187 ","pages":"Article 112847"},"PeriodicalIF":4.6000,"publicationDate":"2025-03-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics and Laser Technology","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0030399225004384","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"OPTICS","Score":null,"Total":0}

引用次数: 0

Abstract

We present a new method for the automatic recognition and precise localization of marker layers within multilayer Laue lenses (MLLs) used for high-resolution X-ray nanofocusing. This approach integrates image processing techniques with machine learning algorithms, encompassing multiple stages including marker layer identification, coarse localization, differentiation, fine localization, and profile fitting. By directly obtaining marker layer profiles, this method eliminates errors induced by various factors such as manual measurements and image misalignment. It is robust and effective in the presence of various image defects. The proposed method enhances and streamlines the characterization of MLL optics, enabling accurate assessment of zone placement and detailed multilayer profile analysis. Consequently, it advances the fabrication of MLL optics and improves their application in high-resolution X-ray nanofocusing.

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来源期刊

Optics and Laser Technology 物理-光学

CiteScore

8.50

自引率

10.00%

发文量

1060

审稿时长

3.4 months

期刊介绍： Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems