Tuning the structural and NO2 gas sensing properties of SnO2 films via In doping

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Ali J. Addie , Shatha Sh. Batros , Azhar I. Hassan
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Abstract

This study investigates the improvement of chemiresistive gas sensor properties in SnO2 thin films by In doping via scalable spray pyrolysis. By systematically varying the indium concentration from 0 to 7.5 at.%, we found that a doping level of 5 at.% optimally maintains crystal integrity while significantly improving the sensor performance for nitrogen dioxide (NO2), a common environmental pollutant. The In-doped sensors achieved a peak sensitivity of 109 at an operating temperature of 200 °C, with a rapid response time of 8 s and a recovery time of 70 s, outperforming the undoped sensors. Structural analysis showed that a 5 at.% doping reduced the grain size from 93 nm to 73 nm, which increased the surface area and improved the dynamics of gas adsorption. In addition, a reduction in surface roughness and a change in the texture coefficient T(110) were observed, indicating that the surfaces have become smoother, and the crystal growth orientations have changed, leading to an improvement in electron transport. Doping with In significantly improves the electronic structure and surface reactivity of SnO2 films. This method enables the production of highly effective NO2 sensors, which are important for air quality monitoring and environmental protection.
通过In掺杂调整SnO2薄膜的结构和NO2气敏性能
本文研究了in掺杂对SnO2薄膜化学阻性气体传感器性能的改善。通过系统地改变铟的浓度从0到7.5 at。%,我们发现兴奋剂水平为5 at。在显著提高二氧化氮(NO2)(一种常见的环境污染物)传感器性能的同时,最佳地保持了晶体完整性。在200℃的工作温度下,掺in的传感器峰值灵敏度为109,快速响应时间为8 s,恢复时间为70 s,优于未掺in的传感器。结构分析显示为5。%的掺杂使晶粒尺寸从93 nm减小到73 nm,增加了比表面积,改善了气体吸附动力学。此外,观察到表面粗糙度的降低和织构系数T(110)的变化,表明表面变得更光滑,晶体生长方向发生了变化,导致电子传递的改善。In的掺入显著改善了SnO2薄膜的电子结构和表面反应性。这种方法可以生产出高效的二氧化氮传感器,对空气质量监测和环境保护具有重要意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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