Antimony sulfide selenide thin film solar cells with comparable characteristics prepared via a choice of chemical deposition or vacuum thermal evaporation
IF 4.2 3区 工程技术Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Priyanka Bamola, Fabiola De Bray Sánchez, M.T.S. Nair, P.K. Nair
{"title":"Antimony sulfide selenide thin film solar cells with comparable characteristics prepared via a choice of chemical deposition or vacuum thermal evaporation","authors":"Priyanka Bamola, Fabiola De Bray Sánchez, M.T.S. Nair, P.K. Nair","doi":"10.1016/j.mssp.2025.109499","DOIUrl":null,"url":null,"abstract":"<div><div>Antimony sulfide selenide solar cells, FTO/CdS/Sb<sub>2</sub>S<sub>x1</sub>Se<sub>3-x1</sub>/Sb<sub>2</sub>S<sub>x2</sub>Se<sub>3-x2</sub>/graphite-Ag, of above 5 % conversion efficiency (<em>η</em>), open circuit voltage (<em>V</em><sub><em>OC</em></sub>) 0.45 V and short circuit current density (<em>J</em><sub><em>SC</em></sub>) 24 mA cm <sup>– 2</sup>, were obtained for Sb<sub>2</sub>S<sub>x</sub>Se<sub>3-x</sub> (160–350 nm) of variable bandgap (<em>E</em><sub><em>g</em></sub>) 1.25–1.5 eV prepared by chemical deposition (CD) or thermal evaporation (TE). Commercial SnO<sub>2</sub>:F (FTO) was coated first with a CdS thin film. For CD - Sb<sub>2</sub>S<sub>x</sub>Se<sub>3-x</sub> absorbers, selenosulfate and thioacetamide were at a molar ratio 0.1:3 for the first deposition, and 1:3 in the second deposition (film thickness, 160 nm). In TE, Sb<sub>2</sub>Se<sub>3</sub>-Sb<sub>2</sub>S<sub>3</sub> was in 1:3 ratio in the first crucible, and distinct in the second (film thickness, 300 nm). CD-Solar cells had <em>η</em>, 5.2 %, <em>J</em><sub><em>SC</em></sub> 23.6 mA cm <sup>– 2</sup> and <em>V</em><sub><em>OC</em></sub> of 0.41 V and the TE-solar cells, 5.75 %, 24.5 mA cm <sup>– 2</sup> and 0.45 V, respectively. Thus, Sb<sub>2</sub>S<sub>x</sub>Se<sub>3-x</sub> of variable <em>E</em><sub><em>g</em></sub> provides a higher <em>V</em><sub><em>OC</em></sub> and conserves <em>J</em><sub><em>SC</em></sub>.</div></div>","PeriodicalId":18240,"journal":{"name":"Materials Science in Semiconductor Processing","volume":"193 ","pages":"Article 109499"},"PeriodicalIF":4.2000,"publicationDate":"2025-03-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Materials Science in Semiconductor Processing","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1369800125002367","RegionNum":3,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Antimony sulfide selenide solar cells, FTO/CdS/Sb2Sx1Se3-x1/Sb2Sx2Se3-x2/graphite-Ag, of above 5 % conversion efficiency (η), open circuit voltage (VOC) 0.45 V and short circuit current density (JSC) 24 mA cm – 2, were obtained for Sb2SxSe3-x (160–350 nm) of variable bandgap (Eg) 1.25–1.5 eV prepared by chemical deposition (CD) or thermal evaporation (TE). Commercial SnO2:F (FTO) was coated first with a CdS thin film. For CD - Sb2SxSe3-x absorbers, selenosulfate and thioacetamide were at a molar ratio 0.1:3 for the first deposition, and 1:3 in the second deposition (film thickness, 160 nm). In TE, Sb2Se3-Sb2S3 was in 1:3 ratio in the first crucible, and distinct in the second (film thickness, 300 nm). CD-Solar cells had η, 5.2 %, JSC 23.6 mA cm – 2 and VOC of 0.41 V and the TE-solar cells, 5.75 %, 24.5 mA cm – 2 and 0.45 V, respectively. Thus, Sb2SxSe3-x of variable Eg provides a higher VOC and conserves JSC.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.