Rapid and sensitive detection of recombinant BK polyomavirus VP1 protein using a molecularly imprinted impedimetric sensor based on poly(o-phenylenediamine)-ZnTeSe@CoCu core/shell quantum dots modified screen-printed gold electrode

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Kirstie Isla Gray , Kayode Omotayo Adeniyi , Svetlana Zolotovskaya , Oluwasesan Adegoke
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引用次数: 0

Abstract

BK polyomavirus (BKV) lies latent and asymptomatic within the human populace today. However, when activated, most commonly in renal transplant recipients, the virus replicates within the body causing cell death and eventually organ dysfunction. This work, reports on the novel synthesis, characterization and application of multi-shaped ZnTeSe@CoCu core/shell quantum dots (QDs) for the rapid, ultrasensitive and selective electrochemical impedimetric detection of BKV VP1 protein with surface imprinted poly(o-phenylenediamine)-BKV VP1 protein on screen-printed gold electrode (SPAuE) integrated on a portable hand-held electrochemical device. The QDs were synthesized using a combination of semiconducting metals as the core and the shell layer being composed of electroactive metals, thus, making the QDs material to be both fluorescent and electrochemically conductive. The QDs surface morphology was characterized of spherical, rod, cubic, pentagonal and hexagonal-shaped particles. Electropolymerization via cyclic voltammetry was used to functionalise the QDs/SPAuE surface with molecularly imprinted polymer (MIP) with o-phenylenediamine being used as the functional monomer to imprint the BKV VP1 protein template. Under optimum reaction conditions, impedimetric detection of BKV VP1 protein was achieved using the MIP@QDs/SPAuE within the linear range of 0.1 fg/mL to 100 pg/mL and a detection limit of 0.51 pg/mL was obtained. BKV VP1 protein was successfully detected in human serum and thus proved the potential of the MIP@QDs/SPAuE for BKV VP1 protein detection in complex biological matrix.

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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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