Effect of Tip Distribution on Plasma Energy Efficiency in Pulsed Multitip-Plane Corona Discharge at Atmospheric Pressure in Dry and Humid Air

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Karim Saber;Alyen Abahazem;Nofel Merbahi;Mohammed Yousfi;Hasna Guedah
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Abstract

This study uses an electrical discharge model. It examines how intertip distance affects energy delivered to a reactor tip-plane configuration. The results are validated against previous experimental measurements. Increasing the intertip distance from 5 to 20 mm in dry air results in a proportional increase in delivered energy. The study also evaluates discharge energy, which is useful energy. It shows a loss of energy at 5 mm, but useful energy at 20 mm. Analysis of energy efficiency for different distances shows a significant improvement, varying from 45% to 88%. A subsequent study in humid air shows that no energy is lost beyond 15 mm. The study also looks at how the tip number affects the reactor’s energy delivery. It found that energy delivery increased with the number of tips. However, efficiencies decreased due to mutual effects between tips. As a result, plasma energy efficiency decreased by up to 35% despite the increase in the tip number. These results stress the key role of the threshold distance. It is vital for better energy efficiency and full coverage of target surfaces.
干湿空气常压下脉冲多尖端平面电晕放电中尖端分布对等离子体能量效率的影响
本研究采用放电模型。它考察了叶尖间距如何影响传递到反应堆叶尖平面结构的能量。结果与先前的实验测量结果进行了验证。在干燥空气中,将叶尖间距从5毫米增加到20毫米会导致输送能量成比例增加。研究还对放电能进行了评价,这是一种有用的能量。它显示在5毫米处能量损失,但在20毫米处有用能量损失。对不同距离的能源效率的分析显示出显著的改善,从45%到88%不等。随后在潮湿空气中进行的一项研究表明,超过15毫米就没有能量损失。该研究还着眼于尖端数量如何影响反应堆的能量输送。研究发现,能量输送随着喷嘴数量的增加而增加。然而,由于尖端之间的相互影响,效率降低了。结果,尽管尖端数量增加,等离子体能量效率却下降了35%。这些结果强调了阈值距离的关键作用。这对提高能源效率和全面覆盖目标表面至关重要。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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