{"title":"An Al-Drain Silicon Transistor With Ultra-Steep Subthreshold Slope and Low Operating Voltage","authors":"Zhibo Chen;Weiao Chen;Baowei Yuan;Yingxin Chen;Chengjie Tang;Weizhuo Gan;Chunsong Zhao;Zhaozhao Hou;Qiang Zhang;Jiachen Gao;Jiale Wang;Jeffrey Xu;Shisheng Xiong;Jing Wan;Ye Lu","doi":"10.1109/LED.2025.3531560","DOIUrl":null,"url":null,"abstract":"A mainstream silicon-based field effect transistor (FET) with sub-60mV/Dec subthreshold swing (SS) is long desired for ideal switching. In this letter, we experimentally demonstrated a novel silicon SOI MOSFET with Al drain, namely AlD-FET. The measurements show that the new device achieves an ultra-steep average SS of <inline-formula> <tex-math>$15~\\mu $ </tex-math></inline-formula>V/dec over 7 decades with high I<inline-formula> <tex-math>$_{\\text {ON}} \\gt 10~\\mu $ </tex-math></inline-formula>A/<inline-formula> <tex-math>$\\mu $ </tex-math></inline-formula>m @ V<inline-formula> <tex-math>$_{\\text {DS}} = 1$ </tex-math></inline-formula>V, and the operating voltage for a sharp SS to occur can be as low as 0.4V. TCAD simulation reveals that the electrical field at Al-Silicon Schottky drain junction is significantly enhanced, and the depletion region under Al drain is elongated. Both facilitate a stronger impact ionization effect at a low VDS to take place, and the additional positive feedback loop further enables the nearly ideal sharp switching.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"46 3","pages":"496-499"},"PeriodicalIF":4.1000,"publicationDate":"2025-01-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10845806/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
A mainstream silicon-based field effect transistor (FET) with sub-60mV/Dec subthreshold swing (SS) is long desired for ideal switching. In this letter, we experimentally demonstrated a novel silicon SOI MOSFET with Al drain, namely AlD-FET. The measurements show that the new device achieves an ultra-steep average SS of $15~\mu $ V/dec over 7 decades with high I$_{\text {ON}} \gt 10~\mu $ A/$\mu $ m @ V$_{\text {DS}} = 1$ V, and the operating voltage for a sharp SS to occur can be as low as 0.4V. TCAD simulation reveals that the electrical field at Al-Silicon Schottky drain junction is significantly enhanced, and the depletion region under Al drain is elongated. Both facilitate a stronger impact ionization effect at a low VDS to take place, and the additional positive feedback loop further enables the nearly ideal sharp switching.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.