Characterization and Optimization of Microwave-Induced Plasma for Enhanced Optical Emission Spectrometry

IF 2.6 3区物理与天体物理 Q3 ENGINEERING, CHEMICAL

Plasma Chemistry and Plasma Processing Pub Date : 2025-01-07 DOI:10.1007/s11090-024-10536-x

H. Sadeghi, S. M. Sadat Kiai, Samaneh Fazelpour, S. P. Shirmardi, Shahriar Fathi

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Abstract

In this study, we present a novel pulsed microwave-induced plasma (MIP) source coupled with a glow discharge for optical emission spectrometry (MIP-OES), operating at 1000 W power and a frequency of 2.45 GHz. The MIP cavity consists of a stainless steel cylindrical waveguide connected to a circular resonator made of the same material, joined through a dielectric quartz disc. The output of the MIP cavity is linked to a closed glow discharge quartz tube and a mechanical pump. Numerical simulations were employed to optimize the structure and dimensions of the MIP cavity. The nozzle position of the cylindrical resonator's output was precisely adjusted to align with the maximum magnetic field, achieving the TM₀₁₁ mode, which results in a point plasma with high density. This configuration enables the cavity to produce a dense, warm plasma emission zone with a consistent emission rate around the circumference of the emitting source. The results demonstrate that the designed MIP source exhibits a significantly higher density and temperature compared to other sources with similar microwave parameters.

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来源期刊

Plasma Chemistry and Plasma Processing 工程技术-工程：化工

CiteScore

5.90

自引率

8.30%

发文量

审稿时长

6-12 weeks

期刊介绍： Publishing original papers on fundamental and applied research in plasma chemistry and plasma processing, the scope of this journal includes processing plasmas ranging from non-thermal plasmas to thermal plasmas, and fundamental plasma studies as well as studies of specific plasma applications. Such applications include but are not limited to plasma catalysis, environmental processing including treatment of liquids and gases, biological applications of plasmas including plasma medicine and agriculture, surface modification and deposition, powder and nanostructure synthesis, energy applications including plasma combustion and reforming, resource recovery, coupling of plasmas and electrochemistry, and plasma etching. Studies of chemical kinetics in plasmas, and the interactions of plasmas with surfaces are also solicited. It is essential that submissions include substantial consideration of the role of the plasma, for example, the relevant plasma chemistry, plasma physics or plasma–surface interactions; manuscripts that consider solely the properties of materials or substances processed using a plasma are not within the journal’s scope.