Effect of Voltage on Two-Step Micro-Arc Oxide Film of Mg-13Gd-4Y-2Zn-0.5Zr Alloy

IF 1.5 4区 材料科学 Q3 Chemistry
Dalong Li, Wei Chen, ChangWei Li, Xin Jing, Kun Sun, Jiaqing Fan, Huagui Huang
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Abstract

Rare earth alloying is one of the effective ways to improve the performance of magnesium alloys, but strong galvanic corrosion occurs when rare earth magnesium alloys meet corrosive substances. To improve the corrosion resistance of rare earth magnesium alloys, this article takes Mg-13Gd-4Y-2Zn-0.5Zr rare earth magnesium alloy as the research object. First, a one-step micro arc oxidation process is used to obtain the film layer. The experiment shows that when the chemical composition and concentration of the electrolyte are constant, changing the voltage parameter of the one-step micro arc oxidation alone cannot prepare a thick, dense, and corrosion-resistant micro arc oxidation film layer, which cannot meet the practical application needs of rare earth magnesium alloys. Then, the one-step micro arc oxidation film layer is used as the substrate sample. By changing the voltage parameters, the sample is subjected to a second micro arc oxidation treatment to prepare a two-step micro arc oxidation film layer. In the study, it is found that the two-step microarc oxidation process increased the thickness of the film layer, which has good densification and corrosion resistance at a voltage of 452.5 V, improving the corrosion resistance of the film layer.

Abstract Image

电压对Mg-13Gd-4Y-2Zn-0.5Zr合金两步微弧氧化膜的影响
稀土合金化是提高镁合金性能的有效途径之一,但稀土镁合金遇到腐蚀性物质时,会发生强烈的电偶腐蚀。为了提高稀土镁合金的耐腐蚀性能,本文以Mg-13Gd-4Y-2Zn-0.5Zr稀土镁合金为研究对象。首先,采用一步微弧氧化工艺获得膜层。实验表明,在电解液的化学成分和浓度一定的情况下,单靠改变一步微弧氧化的电压参数,不能制备出厚、密、耐腐蚀的微弧氧化膜层,不能满足稀土镁合金的实际应用需要。然后,用一步微弧氧化膜层作为衬底样品。通过改变电压参数,对样品进行二次微弧氧化处理,制备两步微弧氧化膜层。在研究中发现,两步微弧氧化工艺增加了膜层厚度,在452.5 V电压下具有良好的致密性和耐腐蚀性,提高了膜层的耐腐蚀性。
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来源期刊
CiteScore
2.50
自引率
6.70%
发文量
121
审稿时长
1.9 months
期刊介绍: The journal Crystal Research and Technology is a pure online Journal (since 2012). Crystal Research and Technology is an international journal examining all aspects of research within experimental, industrial, and theoretical crystallography. The journal covers the relevant aspects of -crystal growth techniques and phenomena (including bulk growth, thin films) -modern crystalline materials (e.g. smart materials, nanocrystals, quasicrystals, liquid crystals) -industrial crystallisation -application of crystals in materials science, electronics, data storage, and optics -experimental, simulation and theoretical studies of the structural properties of crystals -crystallographic computing
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