Ion beam assisted deposition of a thin film metallic glass

Abstract

We have used ion beam assisted deposition to modify the properties of a thin film Pd_77.5Cu₆Si_16.5 metallic glass without altering the composition. By irradiating the film surface during deposition, the mobility of surface atoms is enhanced, leading to the development of atomically smooth films with increased hardness and kinetic stability. Further, increasing the ion beam energy changes the crystallization pathways in the metallic glass films, pointing to changes in as-deposited structure. This approach to tune the properties of metallic glass films may unlock access to previously unobserved structural states.