Processable graphene derivative as an alternative carbon-based electrode

IF 2 4区材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS

Thin Solid Films Pub Date : 2025-01-20 DOI:10.1016/j.tsf.2025.140610

Alvaro Guerra-Him , Julio C. Carrillo-Sendejas , José-Luis Maldonado , Yaily Fernández-Arteaga , Maiby Valle-Orta , Uriel Sierra , Salvador Fernández

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引用次数: 0

Abstract

A processable graphene derivative (PGD) is presented for potential application in organic solar cells (OSCs). PGD was mechanically synthesized, suspended in water and used as an alternative anode in two configurations: 1) Three-layer graphene anode (TLGA): PGD/PH1000/PH1000, where PH1000 is a conductive polymer; PGD was deposited by drop-casting and treated with hydriodic acid, to recover its electrical properties, and with UV-ozone plasma, to improve the adhesion of the next layer (PH1000); it achieved a transmittance (T) (at 550 nm) ∼ 74 % and a resistance (R) ∼ 170 Ω/sq. 2) Hybrid multilayer graphene anode (HMGA): PH1000:PGD (4:1 v/v), 6 layers were deposited by spin-coating and treated with hydriodic acid; this electrode showed T (at 550 nm) ∼ 79 % and R ∼ 134 Ω/sq. As a concept test, alternative anodes TLGA and HMGA were implemented in PM6:Y7-based OSCs to confirm the application of PGD. For the alternative cathode, Field's metal, a eutectic alloy composed of Sn, Bi and In, vacuum free deposited, was used; the achieved efficiencies were of ∼ 8.7 % for the control OSCs, ∼ 4.0 % for TLGA and ∼ 1.4 % for HMGA.

查看原文本刊更多论文

本文介绍了一种可加工的石墨烯衍生物 (PGD)，有望应用于有机太阳能电池 (OSC)。PGD 以机械方式合成，悬浮在水中，并以两种配置用作替代阳极：1) 三层石墨烯阳极（TLGA）：PGD 采用滴注法沉积，并用氢碘酸处理以恢复其电气性能，同时用紫外臭氧等离子体处理以提高下一层（PH1000）的附着力；其透射率（T）（550 纳米时）∼ 74 %，电阻（R）∼ 170 Ω/sq：PH1000:PGD (4:1 v/v)，通过旋涂沉积 6 层，并用氢碘酸处理；该电极的 T 值（550 nm 时）∼ 79 %，R 值∼ 134 Ω/sq。作为概念测试，在基于 PM6:Y7 的 OSC 中采用了替代阳极 TLGA 和 HMGA，以确认 PGD 的应用。替代阴极使用了菲尔德金属，一种由 Sn、Bi 和 In 组成的共晶合金，真空自由沉积；对照 OSC 的效率为 8.7%，TLGA 为 4.0%，HMGA 为 1.4%。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Thin Solid Films 工程技术-材料科学：膜

CiteScore

4.00

自引率

4.80%

发文量

381

审稿时长

7.5 months

期刊介绍： Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.