{"title":"Electrodeposition and electrocatalytic performance of Pd-Ni alloy films from aqueous solutions for enhanced electrochemical hydrogen evolution","authors":"Wangping Wu, Zhengjie Xing, Liu Ju","doi":"10.1016/j.tsf.2024.140587","DOIUrl":null,"url":null,"abstract":"<div><div>Palladium-nickel (Pd-Ni) alloy films were electrodeposited on copper supports. The influence of deposition parameters on the surface morphology and chemical composition of the films was investigated. The surface morphology, chemical composition and elemental states of the films were characterized using scanning electron microscopy, energy-dispersive spectroscopy and X-ray photoelectron spectroscopy, respectively. The electrocatalytic performance of the selected films was evaluated through linear sweep voltammetry, electrochemical impedance spectroscopy and cyclic voltammetry. The results demonstrate that the deposition parameters significantly influenced the deposition rate of the films. The deposition rate increased with the current density, showing a change trend in initially increase and then decrease with the rise in bath temperature and deposition time. The particle size of the film increased with both current density and deposition time. Pd-Ni films exhibited the face-centered cubic structure of polycrystalline phase, the grain size and lattice parameters decreased as the Ni-content increased. Pd<sub>78</sub>Ni<sub>22</sub> film with many spherical particles exhibited good electrocatalytic activity in alkaline solution, requiring only the overpotential of 162 mV to achieve a current density of 10 mA·cm<sup>−</sup>², which demonstrated a low Tafel slope of 47.6 mV·dec<sup>−1</sup> and an exchange current density as high as 0.326 mA·cm<sup>−2</sup>.</div></div>","PeriodicalId":23182,"journal":{"name":"Thin Solid Films","volume":"809 ","pages":"Article 140587"},"PeriodicalIF":2.0000,"publicationDate":"2025-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Thin Solid Films","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0040609024003882","RegionNum":4,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MATERIALS SCIENCE, COATINGS & FILMS","Score":null,"Total":0}
引用次数: 0
Abstract
Palladium-nickel (Pd-Ni) alloy films were electrodeposited on copper supports. The influence of deposition parameters on the surface morphology and chemical composition of the films was investigated. The surface morphology, chemical composition and elemental states of the films were characterized using scanning electron microscopy, energy-dispersive spectroscopy and X-ray photoelectron spectroscopy, respectively. The electrocatalytic performance of the selected films was evaluated through linear sweep voltammetry, electrochemical impedance spectroscopy and cyclic voltammetry. The results demonstrate that the deposition parameters significantly influenced the deposition rate of the films. The deposition rate increased with the current density, showing a change trend in initially increase and then decrease with the rise in bath temperature and deposition time. The particle size of the film increased with both current density and deposition time. Pd-Ni films exhibited the face-centered cubic structure of polycrystalline phase, the grain size and lattice parameters decreased as the Ni-content increased. Pd78Ni22 film with many spherical particles exhibited good electrocatalytic activity in alkaline solution, requiring only the overpotential of 162 mV to achieve a current density of 10 mA·cm−², which demonstrated a low Tafel slope of 47.6 mV·dec−1 and an exchange current density as high as 0.326 mA·cm−2.
期刊介绍:
Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.