The orientation relationships of Ag3Al/Ag interfaces and formation sequence of Ag2Al and Ag3Al at the Ag/Al interface

IF 2 4区 材料科学 Q3 MATERIALS SCIENCE, COATINGS & FILMS
Kuang-Kuo Wang, Dershin Gan
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引用次数: 0

Abstract

The silver-aluminum interface reaction has continued to attract significant interest in recent years, particularly with the development of silver and silver alloy wires for advanced wire bonding techniques. The purpose of this study is to investigate the orientation relationships and interface between mu (μ)-Ag3Al and Ag, as well as formation sequence of gamma (γ)-Ag2Al and μ-Ag3Al at the Ag/Al interface. The orientation relationships and interfaces between μ-Ag3Al and Ag have been studied by transmission electron microscopy (TEM). Epitaxial (001)Ag thin films was grown on the NaCl (001) surface and then Al was evaporated onto the Ag film form μ-Ag3Al. Results showed that the γ-Ag2Al first formed at Ag/Al interface and then the μ-Ag3Al formed after annealing at 350 °C for 5 min. The orientation relationships were found: (1) [221]μ//[001]Ag (zone axis), (1¯10)μ//(110)Ag, and (114¯)μ//(1¯10)Ag at γ-Ag2Al/Ag interface and (2) [0001]γ//[221]μ (zone axis), (1¯100)γ//(11¯0)μ, and (1¯1¯20)γ//(114¯)μ at Ag/Al interface. The μ/Ag and γ/μ interfaces were further analyzed by the surface structures and the orientation relationships.
That γ-Ag2Al forms before μ-Ag3Al in the solid-state Ag/Al interfacial reactions was discussed by heterogeneous nucleation theory. Analysis of the interfaces showed that the γ-Ag2Al/Ag interfacial energies with better interfacial coherency were lower than those that of the μ-Ag3Al/Ag. In addition, the energy of formation of γ-Ag2Al is slightly larger than that of μ-Ag3Al. Therefore γ-Ag2Al forms before μ-Ag3Al.
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来源期刊
Thin Solid Films
Thin Solid Films 工程技术-材料科学:膜
CiteScore
4.00
自引率
4.80%
发文量
381
审稿时长
7.5 months
期刊介绍: Thin Solid Films is an international journal which serves scientists and engineers working in the fields of thin-film synthesis, characterization, and applications. The field of thin films, which can be defined as the confluence of materials science, surface science, and applied physics, has become an identifiable unified discipline of scientific endeavor.
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