Zulfiqar Ali , Iqra Fareed , Aroosha Saif , Muhammad Danish Khan , Hajira Rehman , Areej Zubair , Hafiza Sadia Anam , Faisal Nawaz , Masood ul Hassan Farooq
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引用次数: 0
Abstract
The degradation of organic pollutants from wastewater is a critical global challenge, as it directly impacts environmental health and sustainability. This investigation reports the successful synthesis of SnS/ZnWO4 hybrids with varying quantities of ZnWO4, confirmed via XRD and FTIR, aimed at enhancing photocatalytic activity for the degradation of organic contaminants. FESEM exhibited porous and stacked structural arrangement for SnS/60 % ZnWO₄ with enhanced active sites to facilitate efficient charge transport. The optical bandgap of SnS/60 % ZnWO₄ was calculated to be 2.57 eV, along with PL analysis indicating reduced recombination rates. Photodegradation tests on methylene blue (MB) revealed that SnS/60 % ZnWO4 demonstrated exceptional degradation efficiency, achieving 91.7 % removal of MB within 90 min, possessing a rate constant of 0.02352 min⁻1. •OH⁻ were identified as the primary reactive species responsible for the degradation process. Furthermore, Mott-Schottky analysis and scavenger tests suggested Z-scheme mechanism that facilitates efficient charge separation and enhanced photocatalytic activity. This research highlights the potential of SnS/ZnWO4 hybrids in advanced oxidation processes for effective environmental remediation of organic pollutants.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications.
Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.