Design and Characterization of Se/Nb2O5 Interfaces as High Infrared- Absorbers and High Frequency Band Filters

IF 1.5 4区 材料科学 Q3 Chemistry
A. F. Qasrawi, Rana B Daragme
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Abstract

Herein a new class of optoelectronic devices beneficial for infrared light absorption and high-frequency application in the terahertz frequency domain are designed and fabricated. The devices are formed by coating a highly transparent thin layer of Nb2O5 onto a selenium-thin film to form Se/Nb2O5 (SNO) optical interfaces. Although coating of Nb2O5 nanosheets decreased the crystallite sizes and increased the strain and defect concentration in the hexagonal structured Se films, they successfully increased the light absorption by ≈148% in the infrared range of light. A blueshift in the energy band gap of Se from 2.02 to 2.30 eV is observed. The coating of the Nb2O5 onto Se suppressed the free carrier absorption in Se and Nb2O5. As dielectric active layers, SNO interfaces showed a major resonance dielectric peak centered at 1.67 eV. The optical conductivity and terahertz cutoff frequency analyses which are handled using the Drude-Lorentz approach revealed the highest drift mobility and free carrier concentration of 17.17 cm2 Vs−1 and 5.0  × 10 17 $ \times \ {{10}^{17}}$ cm−3 when an oscillator of energy of 1.75 eV is activated. In addition, the terahertz cutoff frequency spectra which varied in the range of 4.0–131 THz showed the suitability of the SNO devices for terahertz technology and other optoelectronics.

Abstract Image

Se/Nb2O5高红外吸收与高频滤波器界面设计与表征
本文设计和制作了一类新的光电子器件,有利于红外光的吸收和太赫兹频域的高频应用。该器件通过在硒薄膜上涂覆高透明的Nb2O5薄层来形成Se/Nb2O5 (SNO)光学接口。虽然Nb2O5纳米片的涂层减小了六方结构Se薄膜的晶粒尺寸,增加了薄膜的应变和缺陷浓度,但在红外范围内成功地提高了约148%的光吸收率。在Se的能带隙中观察到一个从2.02到2.30 eV的蓝移。Nb2O5在Se表面的涂层抑制了Se和Nb2O5中自由载流子的吸收。作为介质有源层,SNO界面表现出以1.67 eV为中心的主共振介电峰。利用德鲁德-洛伦兹方法进行的光学电导率和太赫兹截止频率分析表明,当激活能量为1.75 eV的振荡器时,漂移迁移率和自由载流子浓度最高,分别为17.17 cm2 Vs - 1和5.0 × 10 17 $ \ × \ {{10}^{17}}$ cm - 3。此外,在4.0-131太赫兹范围内变化的太赫兹截止频谱表明SNO器件适合太赫兹技术和其他光电子技术。
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来源期刊
CiteScore
2.50
自引率
6.70%
发文量
121
审稿时长
1.9 months
期刊介绍: The journal Crystal Research and Technology is a pure online Journal (since 2012). Crystal Research and Technology is an international journal examining all aspects of research within experimental, industrial, and theoretical crystallography. The journal covers the relevant aspects of -crystal growth techniques and phenomena (including bulk growth, thin films) -modern crystalline materials (e.g. smart materials, nanocrystals, quasicrystals, liquid crystals) -industrial crystallisation -application of crystals in materials science, electronics, data storage, and optics -experimental, simulation and theoretical studies of the structural properties of crystals -crystallographic computing
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