Calculation and Analysis of Inelastic Scattering Properties of Crystal Materials

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Runqi Yan;Yonggui Zhai;Jianwei Zhang;Hongguang Wang;Yongdong Li;Meng Cao
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引用次数: 0

Abstract

This work presents an attempt to calculate inelastic scattering properties: differential cross section (dCS), energy loss probability function (ELPF), and inelastic mean free path (IMFP), based on the energy- and momentum-dependent energy loss functions (ELFs) derived from the first-principles calculations for six materials: aluminum (Al), silicon (Si), copper (Cu), silver (Ag), gold (Au), and titanium nitride (TiN). The dCS and ELPF results illuminate detailed differences in energy loss across various materials and energy levels, showcasing the intricate nature of inelastic scattering. The IMFP results follow the same trend as the experimental and computational reference data in the high-energy band, with close values. The three inelastic scattering properties are affected by the ELF features, including the location of the peaks (ridges), the gradient in the direction of momentum, and the shift of the ridges. On this basis, this work also attempts to analyze the correlation between the calculated inelastic scattering properties and the secondary electron yield (SEY) and seeks to qualitatively analyze the differences in the secondary electron (SE) emission properties of various materials.
晶体材料非弹性散射特性的计算与分析
这项工作提出了一种计算非弹性散射特性的尝试:微分截面(dCS),能量损失概率函数(ELPF)和非弹性平均自由程(IMFP),基于能量和动量相关的能量损失函数(ELFs),这些函数来源于六种材料的第一性原理计算:铝(Al),硅(Si),铜(Cu),银(Ag),金(Au)和氮化钛(TiN)。dCS和ELPF的结果阐明了不同材料和能级之间能量损失的详细差异,展示了非弹性散射的复杂性质。在高能波段,IMFP结果与实验和计算参考数据的趋势一致,值相近。三种非弹性散射特性受极低频特征的影响,包括峰(脊)的位置、动量方向的梯度和脊的位移。在此基础上,本工作还试图分析计算出的非弹性散射特性与二次电子产额(SEY)之间的相关性,并试图定性分析不同材料的二次电子发射特性的差异。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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