Investigation of Atmospheric Pressure Plasma Treatment on PCB Surface Finishes

IF 1.3 4区物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS

IEEE Transactions on Plasma Science Pub Date : 2024-12-16 DOI:10.1109/TPS.2024.3507074

Eszter Kocsis;Attila Lukács;István Szalai

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Abstract

Flux is a necessity in the lead-free soldering process. Inactivated flux residues can cause electrical shortages and functional issues by electrochemical migration. Because of miniaturization and the complexity of recent electronic products, a cleaner manufacturing process is required. Atmospheric pressure plasma treatment (PT) is a commonly applied surface cleaning method in the manufacturing industry and has been proved to be effective in improving the wettability in case of metal and polymer surfaces. Three different types of printed circuit board (PCB) surface finishes were investigated before and after PT. Improvement on wettability of the PCB pads is demonstrated. The aim of this study is to investigate the mechanisms of plasma cleaning and to possibly determine the root cause of the improvement of solderability on PCBs resulting from atmospheric pressure PT. For this investigation of the PCB surface finishes, the scanning electron microscopy (SEM) images were taken, and the composition of the surfaces was analyzed by energy dispersive X-ray spectrometry (EDAX) and laser-induced breakdown spectrometry (LIBS) as well.

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常压等离子体处理PCB表面的研究

焊剂在无铅焊接过程中是必不可少的。失活的助焊剂残渣会引起电短缺和电化学迁移引起的功能问题。由于最近电子产品的小型化和复杂性，需要一种更清洁的制造过程。常压等离子体处理（PT）是制造业中常用的表面清洗方法，已被证明在改善金属和聚合物表面的润湿性方面是有效的。研究了三种不同类型的印刷电路板（PCB）表面处理前后的效果，并证明了对PCB衬垫润湿性的改善。本研究的目的是研究等离子清洗的机制，并可能确定大气压PT导致PCB可焊性改善的根本原因。对于PCB表面光洁度的研究，拍摄了扫描电子显微镜（SEM）图像，并通过能量色散x射线光谱（EDAX）和激光诱导击穿光谱（LIBS）分析了表面的成分。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

IEEE Transactions on Plasma Science 物理-物理：流体与等离子体

CiteScore

3.00

自引率

20.00%

发文量

538

审稿时长

3.8 months

期刊介绍： The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.