Interfacial Discharge Characteristics and Insulation Life Analysis of Package Insulation Under Square Voltage Coupled With High Frequency and Steep dv/dt

IF 2.9 2区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Wei Wang;Qingmin Li;Daocheng Lu;Yujie Tang;Jian Wang;Hanwen Ren;Ruoqing Hong
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Abstract

Square voltage coupled high frequency and steep dv/dt is the main cause of interfacial discharge (ID) at the direct bond copper (DBC) substrate of power electronic devices. In this article, a high-frequency partial discharge test system at the junction of ceramic, metal layer, and silicone gel on DBC substrate is built. A partial discharge measurement method capable of shielding from strong electromagnetic interference (EMI) is proposed. The research results show that the rising time is shortened from 500 to 100 ns, and the ID inceptive voltage (IDIV) increases by 13.8%, but it is almost frequency independent. Second, the initial discharge phase is gradually advanced with the shortening of the rising time. The average and maximum discharge amplitude gradually increases and the number of discharges decreases. When the frequency rises from 10 to 50 kHz, the discharge phase percentage increases significantly. While the average discharge amplitude tends to increase and then decrease, the number of discharges increases substantially. Finally, it is found that the frequency is more harmful to the package insulation life than the voltage steepness. The above findings can provide a reference for the high-frequency discharges detection and the package insulation optimization for electronic devices.
高频陡dv/dt耦合方形电压下封装绝缘界面放电特性及绝缘寿命分析
方形电压耦合高频和陡的dv/dt是电力电子器件直接键合铜基板界面放电的主要原因。本文在DBC衬底上建立了陶瓷、金属层和硅凝胶交界处的高频局部放电测试系统。提出了一种屏蔽强电磁干扰的局部放电测量方法。研究结果表明,从500 ns到100 ns的上升时间缩短,起始电压(IDIV)提高了13.8%,但几乎与频率无关。第二,随着上升时间的缩短,初始放电阶段逐渐提前。平均和最大放电幅度逐渐增大,放电次数逐渐减少。当频率从10 kHz增加到50 kHz时,放电相位百分比显著增加。平均放电幅度呈先增大后减小的趋势,放电次数大幅度增加。最后,发现频率对封装绝缘寿命的危害大于电压陡度。上述研究结果可为电子器件高频放电检测和封装绝缘优化提供参考。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
IEEE Transactions on Electron Devices
IEEE Transactions on Electron Devices 工程技术-工程:电子与电气
CiteScore
5.80
自引率
16.10%
发文量
937
审稿时长
3.8 months
期刊介绍: IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.
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