{"title":"Write Endurance Enhanced and Large Memory Window of GeSe-Based Selector-Only Memory With Indium Doping Scheme","authors":"Jinyu Wen;Chuanqi Yi;Jiangxi Chen;Lun Wang;Zixuan Liu;Ziqi Chen;Hao Tong;Xiangshui Miao","doi":"10.1109/LED.2024.3495778","DOIUrl":null,"url":null,"abstract":"Chalcogenide-based novel Selector-Only Memory (SOM) has attracted much attention due to its fast-speed performance and manufacturability. However, the lack of endurance, caused by the polarity operation, needs to be improved. Here, we investigate an indium doping scheme for write endurance enhanced and large memory window of GeSe-based SOM. With the evidence of atomic migration, we propose a trade-off relationship between MW and endurance and a relevant model of Se-migration in a restricted range. Based on this model, we demonstrate that less than 5% In-doping can fit the optimization requirements. Besides, the performance of GeSe devices with different In concentrations further confirms the trade-off relationship. Finally, 3% In-doping GeSe SOM devices are fabricated with a large MW (1.3 V), three orders of magnitude improvement of write endurance compared with GeSe devices (\n<inline-formula> <tex-math>$10^{{6}}$ </tex-math></inline-formula>\n) and excellent read endurance (\n<inline-formula> <tex-math>$10^{{9}}$ </tex-math></inline-formula>\n). This work helps the endurance optimization of SOM devices and is promising to accelerate its widespread application.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"46 1","pages":"115-118"},"PeriodicalIF":4.1000,"publicationDate":"2024-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10750227/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Chalcogenide-based novel Selector-Only Memory (SOM) has attracted much attention due to its fast-speed performance and manufacturability. However, the lack of endurance, caused by the polarity operation, needs to be improved. Here, we investigate an indium doping scheme for write endurance enhanced and large memory window of GeSe-based SOM. With the evidence of atomic migration, we propose a trade-off relationship between MW and endurance and a relevant model of Se-migration in a restricted range. Based on this model, we demonstrate that less than 5% In-doping can fit the optimization requirements. Besides, the performance of GeSe devices with different In concentrations further confirms the trade-off relationship. Finally, 3% In-doping GeSe SOM devices are fabricated with a large MW (1.3 V), three orders of magnitude improvement of write endurance compared with GeSe devices (
$10^{{6}}$
) and excellent read endurance (
$10^{{9}}$
). This work helps the endurance optimization of SOM devices and is promising to accelerate its widespread application.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.