Investigation on an X-Band Relativistic Backward Wave Oscillator Driven by a Dual-Exponential Voltage Pulse

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Ying Cheng;Weihao Liu;Zhengyu Huang;Shaobin Liu;Shangchen Fu
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引用次数: 0

Abstract

Diminishing the dimensions and weight of high-power microwave (HPM) sources at the gigawatt level holds paramount significance in numerous pragmatic applications. Existing HPM sources typically necessitate a precisely rectangular driving pulse, mandating intricate pulse-forming apparatus for the driving source. In this context, our proposal aims to streamline the driving source and alleviate its weight by advocating the utilization of a readily available dual-exponential voltage pulse to drive an X-band relativistic backward-wave oscillator (RBWO). Through detailed particle-in-cell (PIC) simulations, we examine the operational efficiencies of an RBWO driven by dual-exponential voltage pulses. We delve into the spectral properties, power level, and temporal profiles (including rising time, saturation time, and pulse duration) of the resultant HPM generation driven by a dual-exponential voltage pulse, all meticulously delineated and comparable to conventional rectangular-pulse driving scenarios. Our findings underscore the potential of dual-exponential voltage pulses in driving HPM sources, highlighting their compactness and cost-effectiveness as significant advantages.
双指数电压脉冲驱动的x波段相对论后向波振荡器研究
减小千兆瓦级高功率微波源的尺寸和重量在许多实际应用中具有至关重要的意义。现有的HPM源通常需要精确的矩形驱动脉冲,这就要求驱动源需要复杂的脉冲形成装置。在这种情况下,我们的建议旨在通过提倡利用现成的双指数电压脉冲来驱动x波段相对论性反向波振荡器(RBWO),从而简化驱动源并减轻其重量。通过详细的PIC模拟,我们研究了双指数电压脉冲驱动的RBWO的工作效率。我们深入研究了由双指数电压脉冲驱动的HPM产生的频谱特性、功率水平和时间分布(包括上升时间、饱和时间和脉冲持续时间),所有这些都经过精心描述,可与传统的矩形脉冲驱动场景相媲美。我们的研究结果强调了双指数电压脉冲在驱动HPM源方面的潜力,强调了它们的紧凑性和成本效益作为显著优势。
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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