{"title":"Rice Seed Germination Improvement by Atmospheric Pressure Plasma Surface Modification With Water Buffer","authors":"Pin-Yuan Lai;Yuan-Tai Lai;Sheng-Yu Hsu;Po-Yu Chen;Jenq-Gong Duh","doi":"10.1109/TPS.2024.3497133","DOIUrl":null,"url":null,"abstract":"Atmospheric pressure plasma (APP) treatment improves seed germination by introducing functional groups or etching to change its surface chemical characteristics. This study focuses on improving rice surface properties and reveals that water acting as a buffer plays a key role in APP treatment for the enhancement of seed germination. After a 150-s water buffer APP treatment, the germination percentage of rice seeds increased from 45% to 84% compared with the control group. This improvement can be attributed to the enrichment of surface polar functional groups resulting from the plasma treatment. Surface energy calculations revealed a remarkable increase in the polar component, leading to a substantial reduction in the water contact angle (WCA) from 105° to 40°. This indicates a significant enhancement in surface wettability, rendering it more hydrophilic. Consequently, water uptake from the seed surface also significantly increased. Moreover, X-ray photoelectron spectroscopy (XPS) showed that polar −NO functional groups were enhanced on the seed surface treated by APP with water buffer. The −NO functional groups were formed through a surface reaction between oxygen-excited species OH\n<inline-formula> <tex-math>$^{\\ast }$ </tex-math></inline-formula>\n and N\n<inline-formula> <tex-math>$_{2}^{+}$ </tex-math></inline-formula>\n ions or N\n<inline-formula> <tex-math>$_{2}^{\\ast }$ </tex-math></inline-formula>\n species on the seed surface, which can improve the wettability and provide additional nutrition to seed germination. Consequently, APP seed treatment with water buffer can potentially facilitate seed germination.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 10","pages":"5184-5192"},"PeriodicalIF":1.3000,"publicationDate":"2024-11-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10768954/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
引用次数: 0
Abstract
Atmospheric pressure plasma (APP) treatment improves seed germination by introducing functional groups or etching to change its surface chemical characteristics. This study focuses on improving rice surface properties and reveals that water acting as a buffer plays a key role in APP treatment for the enhancement of seed germination. After a 150-s water buffer APP treatment, the germination percentage of rice seeds increased from 45% to 84% compared with the control group. This improvement can be attributed to the enrichment of surface polar functional groups resulting from the plasma treatment. Surface energy calculations revealed a remarkable increase in the polar component, leading to a substantial reduction in the water contact angle (WCA) from 105° to 40°. This indicates a significant enhancement in surface wettability, rendering it more hydrophilic. Consequently, water uptake from the seed surface also significantly increased. Moreover, X-ray photoelectron spectroscopy (XPS) showed that polar −NO functional groups were enhanced on the seed surface treated by APP with water buffer. The −NO functional groups were formed through a surface reaction between oxygen-excited species OH
$^{\ast }$
and N
$_{2}^{+}$
ions or N
$_{2}^{\ast }$
species on the seed surface, which can improve the wettability and provide additional nutrition to seed germination. Consequently, APP seed treatment with water buffer can potentially facilitate seed germination.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.