Hole Trap Formation in Quantum Dot Light-Emitting Diodes Under Electrical Stress

IF 5.3 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Jiangxia Huang, Wenxin Lin, Shuxin Li, Jiahao Li, Haonan Feng, Dongchen Lan, Xiongfeng Lin, Yulin Guo, Wenlin Liang, Longjia Wu, Paul W. M. Blom, Quan Niu, Yuguang Ma
{"title":"Hole Trap Formation in Quantum Dot Light-Emitting Diodes Under Electrical Stress","authors":"Jiangxia Huang, Wenxin Lin, Shuxin Li, Jiahao Li, Haonan Feng, Dongchen Lan, Xiongfeng Lin, Yulin Guo, Wenlin Liang, Longjia Wu, Paul W. M. Blom, Quan Niu, Yuguang Ma","doi":"10.1002/aelm.202400231","DOIUrl":null,"url":null,"abstract":"Quantum dot light-emitting diodes (QLEDs) have emerged as promising candidates for next-generation display technology, but the limited lifetime of QLEDs hampers their further commercialization. Despite extensive research that has been conducted for the last decades, the mechanism leading to the rapid degradation of QLEDs remains unclear. Here, the formation of hole traps is demonstrated as the critical reason for the degradation of QLEDs. Applying impedance measurements, an enhancement of the negative capacitance is observed and provides straightforward evidence for the formation of hole traps. The generated hole traps introduce additional trap-assisted recombination of trapped holes with free electrons, as reflected by the evolution and voltage dependence of the electroluminescence spectra, leading to efficiency loss in degraded devices. By performing numerical simulations to model the degradation of QLEDs, the formation of hole traps is quantified as a function of aging time. The calculated hole trap density is consistent with that as measured from impedance spectroscopy, validating that the hole trap formation is the mechanism for the voltage drift and efficiency decrease of QLEDs under constant current stress.","PeriodicalId":110,"journal":{"name":"Advanced Electronic Materials","volume":"31 1","pages":""},"PeriodicalIF":5.3000,"publicationDate":"2024-12-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/aelm.202400231","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Quantum dot light-emitting diodes (QLEDs) have emerged as promising candidates for next-generation display technology, but the limited lifetime of QLEDs hampers their further commercialization. Despite extensive research that has been conducted for the last decades, the mechanism leading to the rapid degradation of QLEDs remains unclear. Here, the formation of hole traps is demonstrated as the critical reason for the degradation of QLEDs. Applying impedance measurements, an enhancement of the negative capacitance is observed and provides straightforward evidence for the formation of hole traps. The generated hole traps introduce additional trap-assisted recombination of trapped holes with free electrons, as reflected by the evolution and voltage dependence of the electroluminescence spectra, leading to efficiency loss in degraded devices. By performing numerical simulations to model the degradation of QLEDs, the formation of hole traps is quantified as a function of aging time. The calculated hole trap density is consistent with that as measured from impedance spectroscopy, validating that the hole trap formation is the mechanism for the voltage drift and efficiency decrease of QLEDs under constant current stress.

Abstract Image

电应力下量子点发光二极管中的空穴陷阱形成
量子点发光二极管(qled)已成为下一代显示技术的有前途的候选者,但qled有限的使用寿命阻碍了其进一步的商业化。尽管在过去的几十年里进行了广泛的研究,但导致qled快速退化的机制仍不清楚。在这里,空穴陷阱的形成被证明是qled退化的关键原因。应用阻抗测量,观察到负电容的增强,并为空穴陷阱的形成提供了直接的证据。产生的空穴陷阱引入了额外的陷阱辅助的被困空穴与自由电子的重组,正如电致发光光谱的演化和电压依赖性所反映的那样,导致退化器件的效率损失。通过数值模拟来模拟qled的退化,将空穴阱的形成量化为老化时间的函数。计算得到的空穴阱密度与阻抗谱测量结果一致,验证了空穴阱的形成是恒流应力下qled电压漂移和效率下降的机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Advanced Electronic Materials
Advanced Electronic Materials NANOSCIENCE & NANOTECHNOLOGYMATERIALS SCIE-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
11.00
自引率
3.20%
发文量
433
期刊介绍: Advanced Electronic Materials is an interdisciplinary forum for peer-reviewed, high-quality, high-impact research in the fields of materials science, physics, and engineering of electronic and magnetic materials. It includes research on physics and physical properties of electronic and magnetic materials, spintronics, electronics, device physics and engineering, micro- and nano-electromechanical systems, and organic electronics, in addition to fundamental research.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信