Relaxation of Electric Field by Covering Cathode Edge With Vanadate Glass

IF 1.3 4区 物理与天体物理 Q3 PHYSICS, FLUIDS & PLASMAS
Souichi Katagiri;Tatsuya Miyake;Takashi Naito;Hiroshi Morita;Yasushi Yamano
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引用次数: 0

Abstract

The surface flashover discharge model under direct current (dc) voltage in a vacuum is considered an avalanche discharge induced according to the field emission electrons generated by the electric field concentration and secondary electron yield on the insulator surface. One of the effective ways to suppress this phenomenon is to suppress the field emission electrons at the origin. We have investigated a method for relaxing the field concentration by covering the cathode edge with metallic glass, and the following conclusions were obtained. Metallic glasses are conductive dielectrics and can be sintered to form amorphous and smooth surfaces. Covering the cathode surface with metallic glass is expected to relax the electric field concentration around the cathode edge. The metallic glass evaluated was vanadium-based, with a glass transition temperature of 321 °C, a crystallization temperature of 439 °C, a resistivity of 107– $10^{8}~\Omega $ -cm, and a relative permittivity of 15. The withstand voltage of a sample with a cathode and an anode formed on an alumina surface was evaluated with and without a metallic glass coating on the cathode edge. As a result, the voltage holding capability was approximately 2.7 times higher than without the coating, under an ultrahigh vacuum of 10−7 Pa, and a good electric field relaxation effect was obtained. The numerical simulation of the electric field concentration relaxation effect of metallic glass as a conductive dielectric material showed that the relaxation effect was equivalent to the experimental results. Future applications will include practical applications such as pin-to-pin interaction in multipin feedthroughs.
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来源期刊
IEEE Transactions on Plasma Science
IEEE Transactions on Plasma Science 物理-物理:流体与等离子体
CiteScore
3.00
自引率
20.00%
发文量
538
审稿时长
3.8 months
期刊介绍: The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.
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