{"title":"“M”-Shaped Threshold Voltage Shift Induced by Competitive Positive/Negative Gate Switching Stress in Schottky-Type p-GaN Gate HEMTs","authors":"Yunfeng Hu;Liang He;Meng Dong;Xinghuan Chen;Yijun Shi;Zhiyuan He;Zongqi Cai;Yiqiang Ni;Hongyue Wang;Zhizhe Wang;Yuan Li;Xiaoli Lu;Yuan Chen;Yiqiang Chen","doi":"10.1109/LED.2024.3480253","DOIUrl":null,"url":null,"abstract":"This work investigates the threshold voltage (\n<inline-formula> <tex-math>${V}_{\\text {th}}\\text {)}$ </tex-math></inline-formula>\n instability in Schottky-type p-GaN gate HEMTs subjected to positive/negative gate switching stress. Under the gate switching stress, a characteristic “M”-shaped \n<inline-formula> <tex-math>${V}_{\\text {th}}$ </tex-math></inline-formula>\n curve with elevated \n<inline-formula> <tex-math>${V}_{\\text {GS,ON}}$ </tex-math></inline-formula>\n is revealed. This pattern is ascribed to the competitive transport of electrons and holes. Considering the condition of reduced \n<inline-formula> <tex-math>${V}_{\\text {GS, OFF}}$ </tex-math></inline-formula>\n, an increasing \n<inline-formula> <tex-math>${V} _{\\text {th}}$ </tex-math></inline-formula>\n has also been observed, which is attributed to the curtailed electron emission while the promoted hole release. Further, with the increasing of the duty cycle, a positive \n<inline-formula> <tex-math>${V}_{\\text {th}}$ </tex-math></inline-formula>\n shift at the lower \n<inline-formula> <tex-math>${V}_{\\text {GS, ON}}$ </tex-math></inline-formula>\n and a negative shift at higher \n<inline-formula> <tex-math>${V}_{\\text {GS, ON}}$ </tex-math></inline-formula>\n are needs to be taken seriously, and it also confirm the competitive mechanism in the abnormal “M”-shaped \n<inline-formula> <tex-math>${V}_{\\text {th}}$ </tex-math></inline-formula>\n instability. The research highlights that the impact of positive/negative gate switching stress on \n<inline-formula> <tex-math>${V}_{\\text {th}}$ </tex-math></inline-formula>\n instability are significant and cannot be neglected.","PeriodicalId":13198,"journal":{"name":"IEEE Electron Device Letters","volume":"45 12","pages":"2299-2302"},"PeriodicalIF":4.1000,"publicationDate":"2024-10-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Electron Device Letters","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10716607/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
This work investigates the threshold voltage (
${V}_{\text {th}}\text {)}$
instability in Schottky-type p-GaN gate HEMTs subjected to positive/negative gate switching stress. Under the gate switching stress, a characteristic “M”-shaped
${V}_{\text {th}}$
curve with elevated
${V}_{\text {GS,ON}}$
is revealed. This pattern is ascribed to the competitive transport of electrons and holes. Considering the condition of reduced
${V}_{\text {GS, OFF}}$
, an increasing
${V} _{\text {th}}$
has also been observed, which is attributed to the curtailed electron emission while the promoted hole release. Further, with the increasing of the duty cycle, a positive
${V}_{\text {th}}$
shift at the lower
${V}_{\text {GS, ON}}$
and a negative shift at higher
${V}_{\text {GS, ON}}$
are needs to be taken seriously, and it also confirm the competitive mechanism in the abnormal “M”-shaped
${V}_{\text {th}}$
instability. The research highlights that the impact of positive/negative gate switching stress on
${V}_{\text {th}}$
instability are significant and cannot be neglected.
期刊介绍:
IEEE Electron Device Letters publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors.