Strain-induced effects on the physical properties of rare-earth magnetic oxides RMO3 (R= La, Pr; M = Fe, Mn); via first principles

IF 4.2 3区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Wasif ur Rehman , Akbar Ali , Sarah A. Alsalhi , Taoufik Saidani , Izaz Ul Haq , Imad Khan
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Abstract

The impact of uniaxial strain on the structure, electronic, magnetic, and elastic characteristic of rare-earth transition metal oxides RMO3 (R= La, Pr; M = Fe, Mn) are investigated for potential applications in magnetic storage devices, sensors, photovoltaics, and electronic devices using first-principles based density functional theory calculations, incorporating the Hubbard parameter U. These materials are stable in orthorhombic crystal symmetry (space group Pnma No. 62) and possesses spontaneous MO6 octahedral distortion, which causes stability in the crystal lattice and is responsible to arise cooperative Jahn-Teller (JT) distortions. There is a strong influence of strain on structure parameters such as lattice constants, bond lengths and Q2/Q3 vibrational modes. This influence provides a knob for tuning the physical properties of these materials, which is essential for advanced materials engineering in their technological applications. G-type antiferromagnetic (G-AFM) phase was found to have a favorable magnetic ground state and can be tuned with strain, which can enhance the storage capacity of these materials. These materials are direct band and optically active materials with ground state band gap values 2.11, 2.06, 2.01 and 2.03 eV for LaFeO3, PrFeO3, LaMnO3, and PrMnO3 respectively, the band gap values lies in the visible region of electromagnetic spectrum, enable them for advanced technological applications in transistors, photo-detectors and optoelectronic devices. Further the band gap values can be tuned via strain for desired device applications. The elastic constants calculations reveal that the crystallographic c-axis is more favorable for compressibility as compared to a- and b-axis.

Abstract Image

应变对稀土磁性氧化物RMO3 (R= La, Pr)物理性能的影响M = Fe, Mn);通过第一性原理
单轴应变对稀土过渡金属氧化物RMO3 (R= La, Pr;利用基于第一性原理的密度泛函理论计算,结合Hubbard参数u,研究了M = Fe, Mn)在磁存储器件、传感器、光伏和电子器件中的潜在应用。这些材料在正交晶体对称(空间群Pnma No. 62)中是稳定的,并且具有自发的MO6八面体畸变,这导致了晶格的稳定性,并导致了合作的Jahn-Teller (JT)畸变。应变对晶格常数、键长和Q2/Q3振动模式等结构参数有较大影响。这种影响为调整这些材料的物理特性提供了一个旋钮,这对于先进材料工程在其技术应用中至关重要。g型反铁磁(G-AFM)相具有良好的磁性基态,可以随应变调谐,从而提高了材料的存储容量。这些材料是直接带和光活性材料,LaFeO3、PrFeO3、LaMnO3和PrMnO3的基态带隙分别为2.11、2.06、2.01和2.03 eV,其带隙值位于电磁波谱的可见区域,使其在晶体管、光电探测器和光电器件中具有先进的技术应用。此外,带隙值可以通过应变来调整,以满足所需的器件应用。弹性常数计算表明,晶体c轴比a轴和b轴更有利于压缩。
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来源期刊
Materials Science in Semiconductor Processing
Materials Science in Semiconductor Processing 工程技术-材料科学:综合
CiteScore
8.00
自引率
4.90%
发文量
780
审稿时长
42 days
期刊介绍: Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy. Each issue will aim to provide a snapshot of current insights, new achievements, breakthroughs and future trends in such diverse fields as microelectronics, energy conversion and storage, communications, biotechnology, (photo)catalysis, nano- and thin-film technology, hybrid and composite materials, chemical processing, vapor-phase deposition, device fabrication, and modelling, which are the backbone of advanced semiconductor processing and applications. Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.
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