Decoupled measurement of silicon-based film and substrate thickness by hybrid reflectance spectroscopy

IF 4.6 2区物理与天体物理 Q1 OPTICS

Optics and Laser Technology Pub Date : 2024-11-17 DOI:10.1016/j.optlastec.2024.112143

Bai Chengpei , Sun Xinlei , Liu Zhaoran, Niu Baoxin, Wang Zizheng, Yao Chengyuan, Shen Wanfu, Hu Chunguang

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引用次数: 0

Abstract

Semiconductor manufacturing requires accurate measurement of film thickness, which significantly impacts the performance and reliability of device based on multilayer film structures. In this study, to simultaneously analyze multilayer films with significant thickness differences, a hybrid reflectance spectroscopy was proposed by combining differential reflectance spectroscopy (DRS) for thin films and reflectance spectroscopy (RS) for thick substrate. By integrating visible and near-infrared light, a comprehensive system is developed with microscopic imaging, DRS, and RS techniques. Furthermore, a practical algorithm was proposed to obtain the thickness differences of multilayer structure like Silicon-on-Insulator (SOI), with thickness of layers ranging from nanometers to micrometers and substrate thickness at hundreds of micrometers. The ability of wide range measurement and repeatability was verified by experiment conducted on SiO₂/Si samples, with thickness compared to nominal thickness by commercial ellipsometer across a range of 12 nm to 500 nm. The decouple of multilayer thickness was validated by experiment conducted on SOI, comparing to nominal thickness by scanning electron microscope (SEM).

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利用混合反射光谱法对硅基薄膜和基底厚度进行解耦测量

半导体制造需要精确测量薄膜厚度，这对基于多层薄膜结构的设备的性能和可靠性有重大影响。为了同时分析厚度差异显著的多层薄膜，本研究提出了一种混合反射光谱法，将用于薄膜的差分反射光谱法（DRS）和用于厚基底的反射光谱法（RS）结合起来。通过整合可见光和近红外光，开发出一种集显微成像、DRS 和 RS 技术于一体的综合系统。此外，还提出了一种实用算法，用于获取多层结构（如绝缘体上硅（SOI））的厚度差异，其层厚从纳米到微米不等，而基底厚度可达数百微米。在二氧化硅/硅样品上进行的实验验证了宽范围测量的能力和重复性，商用椭偏仪在 12 纳米到 500 纳米的范围内将厚度与标称厚度进行了比较。在 SOI 上进行的实验验证了多层厚度的解耦，并通过扫描电子显微镜（SEM）与标称厚度进行了比较。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Optics and Laser Technology 物理-光学

CiteScore

8.50

自引率

10.00%

发文量

1060

审稿时长

3.4 months

期刊介绍： Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems