Off-Axis Electron Holography as a Tool for the Mapping of Electromagnetic Properties in the Semiconductor Industry

Abstract

In this paper we discuss the state-of-the-art of off-axis electron holography today. We introduce the method and illustrate how it can be used for the measurements of dopants and polarization potentials in a range of different semiconductor materials. We then demonstrate how it can be used to measure the magnetic fields around technologically relevant materials for spintronics. Within this work we also demonstrate the use of off-axis electron holography during in-situ electrical biasing experiments for the study of micro-LED devices and in-situ annealing for the case of MRAM devices. We discuss when holography can and cannot be successfully applied and demonstrate clearly that it is a useful tool that can be used for routine analysis in the semiconductor industry.