Welder F. Perina , Joao A. Martino , Eddy Simoen , Uthayasankaran Peralagu , Nadine Collaert , Paula G.D. Agopian
{"title":"Temperature influence on experimental analog behavior of MISHEMTs","authors":"Welder F. Perina , Joao A. Martino , Eddy Simoen , Uthayasankaran Peralagu , Nadine Collaert , Paula G.D. Agopian","doi":"10.1016/j.sse.2024.109028","DOIUrl":null,"url":null,"abstract":"<div><div>This work presents an analysis on experimental analog behavior of MISHEMTs operating in the temperature range from 450 K down to 200 K. The drain current (I<sub>DS</sub>) presented a slight anomaly, especially for temperatures lower than 400 K. In the transconductance it is possible to visualize a second peak, suggesting a second conduction. As shown, the transconductance presented a low dependence on gate length, and an anomaly was observed for the devices at 350 K. The output conductance and transistor efficiency behavior suggest a competition between the effects of the MOS and HEMT conductions, present in the device. A new kink was observed in the output characteristic (I<sub>DS</sub>xV<sub>DS</sub>) at room temperature, which is caused by the HEMT and MOS conductions interaction, and it is even more noticeable for higher overdrive voltages (V<sub>GT</sub>). This effect is called MISHEMT kink effect (MH-kink) in this work. The MH-kink shifts toward higher V<sub>DS</sub> for higher overdrive voltage, showing the stronger influence of the MOS conduction on the total drain current. The unity gain frequency (f<sub>t</sub>) increases from 800 MHz (450 K) to 1.8 GHz (200 K), while the A<sub>V</sub> goes in opposite direction from 43 dB (450 K) to 38 dB (200 K). Considering that the intrinsic voltage gain is good enough even at low temperatures, the MISHEMT can be identified as a good candidate for analog applications.</div></div>","PeriodicalId":21909,"journal":{"name":"Solid-state Electronics","volume":"223 ","pages":"Article 109028"},"PeriodicalIF":1.4000,"publicationDate":"2024-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Solid-state Electronics","FirstCategoryId":"101","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0038110124001771","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
This work presents an analysis on experimental analog behavior of MISHEMTs operating in the temperature range from 450 K down to 200 K. The drain current (IDS) presented a slight anomaly, especially for temperatures lower than 400 K. In the transconductance it is possible to visualize a second peak, suggesting a second conduction. As shown, the transconductance presented a low dependence on gate length, and an anomaly was observed for the devices at 350 K. The output conductance and transistor efficiency behavior suggest a competition between the effects of the MOS and HEMT conductions, present in the device. A new kink was observed in the output characteristic (IDSxVDS) at room temperature, which is caused by the HEMT and MOS conductions interaction, and it is even more noticeable for higher overdrive voltages (VGT). This effect is called MISHEMT kink effect (MH-kink) in this work. The MH-kink shifts toward higher VDS for higher overdrive voltage, showing the stronger influence of the MOS conduction on the total drain current. The unity gain frequency (ft) increases from 800 MHz (450 K) to 1.8 GHz (200 K), while the AV goes in opposite direction from 43 dB (450 K) to 38 dB (200 K). Considering that the intrinsic voltage gain is good enough even at low temperatures, the MISHEMT can be identified as a good candidate for analog applications.
期刊介绍:
It is the aim of this journal to bring together in one publication outstanding papers reporting new and original work in the following areas: (1) applications of solid-state physics and technology to electronics and optoelectronics, including theory and device design; (2) optical, electrical, morphological characterization techniques and parameter extraction of devices; (3) fabrication of semiconductor devices, and also device-related materials growth, measurement and evaluation; (4) the physics and modeling of submicron and nanoscale microelectronic and optoelectronic devices, including processing, measurement, and performance evaluation; (5) applications of numerical methods to the modeling and simulation of solid-state devices and processes; and (6) nanoscale electronic and optoelectronic devices, photovoltaics, sensors, and MEMS based on semiconductor and alternative electronic materials; (7) synthesis and electrooptical properties of materials for novel devices.