R. Vishwanath , R. Ranjith , K. Munirathnam , J. Shim , P.C. Nagajyothi , Sabah Ansar , V. Manjunath
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引用次数: 0
Abstract
In emerging organic-inorganic perovskite solar cells (PSCs), the role of efficient electron transport layers (ETLs) is critical for electron transfer and hole blocking. TiO2 is one of the widely reported ETLs but limits the performance of the devices exhibiting restricted electron mobility and numerous defect states. The process of doping rare earth ions has been an effective approach in improving the electronic and optical properties of TiO2 for enhanced efficiency of PSCs. The present work studies the effect of praseodymium (Pr3+) doped TiO2 prepared via sol-gel technique as electron transport layers for lead-free perovskite solar cells. The X-ray diffraction (XRD) and diffuse reflectance spectroscopy (DRS) studies showed that the crystallite size and bandgap of the particles reduced as a function of Pr3+ doping concentration. The X-ray photoelectron spectroscopy (XPS) analysis of the samples inferred that Pr3+ ions majorly remained on the TiO2 surface. Copper-based (CH3NH2)2CuBr4 perovskites were synthesized by solution method as an active layer for the solar cells. XRD, FTIR (Fourier Transform Infrared Spectroscopy) and XPS analysis confirmed the formation of 2D-perovskite phase of the samples. The scanning electron microscopy (SEM) analysis of the perovskites revealed well crystalline orthorhombic structures. Current-voltage measurements were carried out to study better passivation properties with rare-earth doping of the ETLs and was found to be most enhanced for 0.07 Pr3+ concentration. Electro-chemical Impedance Spectroscopy (EIS) studies of the solar cells showed a reduced interface recombination and enhance charge transfer properties as a function of rare-earth dopant concentration. Further, the fabricated perovskite solar cells showcased better performance with xPr3+:TiO2 ETLs and the maximum efficiency of ∼1.25 % was obtained for TiO2: 0.07 Pr3+.
期刊介绍:
Materials Science in Semiconductor Processing provides a unique forum for the discussion of novel processing, applications and theoretical studies of functional materials and devices for (opto)electronics, sensors, detectors, biotechnology and green energy.
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Coverage will include: advanced lithography for submicron devices; etching and related topics; ion implantation; damage evolution and related issues; plasma and thermal CVD; rapid thermal processing; advanced metallization and interconnect schemes; thin dielectric layers, oxidation; sol-gel processing; chemical bath and (electro)chemical deposition; compound semiconductor processing; new non-oxide materials and their applications; (macro)molecular and hybrid materials; molecular dynamics, ab-initio methods, Monte Carlo, etc.; new materials and processes for discrete and integrated circuits; magnetic materials and spintronics; heterostructures and quantum devices; engineering of the electrical and optical properties of semiconductors; crystal growth mechanisms; reliability, defect density, intrinsic impurities and defects.