{"title":"Influence of Armature/Rail Structure Coordination on the Evolution of Rail Deposition Layer","authors":"Chengxian Li;Dong Zeyu;Shen Shifeng;Liu Liming;Hou Jiaxin;Xu Jinghan;Xia Shengguo","doi":"10.1109/TPS.2024.3462510","DOIUrl":null,"url":null,"abstract":"During the launch of the railgun, the interface of the armature/rail (A/R) will undergo severe melting and wear. The molten armature material will further solidify and deposit on the surface of the rail to form an aluminum deposition layer, which will change the original contact state and affect the subsequent armature launch performance. The evolution of the deposition layer under flat rails and D-shaped rails was experimentally studied. The study found that the deposition layer presents a changing trend of thickness on both sides and thin in the middle. With the increases in the number of experiments, the thickness of the deposition layer gradually accumulates, however, in the end, the thickness of the deposition layer tends to stabilize. Experiments have found that the horizontal distribution of the D-shaped rail deposition layer is more uniform than that of the flat rail, and the increase rate of the thickness of the deposition layer is lower than that of the flat rail. Based on the analysis of the A/R contact resistance and current density distribution, we have given an explanation for the difference in the thickness distribution of the deposition layer. In addition, the thickness of the deposition layer tends to be stable under the two rail conditions because the bond strength of the deposition layer and the rail decreases after repeated launch, and the tensile stress increases, which leads to the peeling off of the deposition layer.","PeriodicalId":450,"journal":{"name":"IEEE Transactions on Plasma Science","volume":"52 8","pages":"3294-3302"},"PeriodicalIF":1.3000,"publicationDate":"2024-10-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Plasma Science","FirstCategoryId":"101","ListUrlMain":"https://ieeexplore.ieee.org/document/10705940/","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"PHYSICS, FLUIDS & PLASMAS","Score":null,"Total":0}
引用次数: 0
Abstract
During the launch of the railgun, the interface of the armature/rail (A/R) will undergo severe melting and wear. The molten armature material will further solidify and deposit on the surface of the rail to form an aluminum deposition layer, which will change the original contact state and affect the subsequent armature launch performance. The evolution of the deposition layer under flat rails and D-shaped rails was experimentally studied. The study found that the deposition layer presents a changing trend of thickness on both sides and thin in the middle. With the increases in the number of experiments, the thickness of the deposition layer gradually accumulates, however, in the end, the thickness of the deposition layer tends to stabilize. Experiments have found that the horizontal distribution of the D-shaped rail deposition layer is more uniform than that of the flat rail, and the increase rate of the thickness of the deposition layer is lower than that of the flat rail. Based on the analysis of the A/R contact resistance and current density distribution, we have given an explanation for the difference in the thickness distribution of the deposition layer. In addition, the thickness of the deposition layer tends to be stable under the two rail conditions because the bond strength of the deposition layer and the rail decreases after repeated launch, and the tensile stress increases, which leads to the peeling off of the deposition layer.
期刊介绍:
The scope covers all aspects of the theory and application of plasma science. It includes the following areas: magnetohydrodynamics; thermionics and plasma diodes; basic plasma phenomena; gaseous electronics; microwave/plasma interaction; electron, ion, and plasma sources; space plasmas; intense electron and ion beams; laser-plasma interactions; plasma diagnostics; plasma chemistry and processing; solid-state plasmas; plasma heating; plasma for controlled fusion research; high energy density plasmas; industrial/commercial applications of plasma physics; plasma waves and instabilities; and high power microwave and submillimeter wave generation.