Hybrid Schottky and heterojunction vertical β-Ga2O3 rectifiers†

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Jian-Sian Li, Chiao-Ching Chiang, Hsiao-Hsuan Wan, Madani Labed, Jang Hyeok Park, You Seung Rim, Meng-Hsun Yu, Fan Ren, Yu-Te Liao and Stephen J. Pearton
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Abstract

Junction barrier Schottky design Ga2O3 rectifiers allow for a combination of low turn-on voltage and high breakdown voltage. Ni/Au/Ga2O3 Schottky rectifiers and NiO/Ga2O3 heterojunction rectifiers were fabricated on the same wafer and the percentage of the relative areas and diameters of each were varied from pure Schottky devices to pure heterojunction devices. The on-voltage increased from 0.6 V for Schottky rectifiers to 2.4 V for heterojunction rectifiers, with a monotonic decrease in forward current at fixed bias of 5 V from 375 nA cm−2 to 175 nA cm−2. Conversely, the breakdown voltage increased monotonically as the proportion of heterojunction area increased, from 1.2 kV for Schottky rectifiers to 6.2 kV for pure heterojunction devices. Breakdown mostly was initiated at the edge of the anode contact but could also occur at the transition region from the Schottky contact to NiO edge termination. The Baliga figure of merit increased with both the relative percentage of area and diameter of the heterojunction contact from 0.2 GW cm−2 to 3 GW cm−2, while the energy loss during switching also increased from 2 to 3.9 W cm−2. These trends illustrate the trade-offs of Schottky versus pn junctions for the operation of Ga2O3 rectifiers.

Abstract Image

混合肖特基和异质结垂直式 β-Ga2O3 整流器†。
采用结势垒肖特基设计的 Ga2O3 整流器可将低开启电压和高击穿电压结合起来。在同一晶片上制造了 Ni/Au/Ga2O3 肖特基整流器和 NiO/Ga2O3 异质结整流器,并改变了纯肖特基器件和纯异质结器件的相对面积和直径百分比。导通电压从肖特基整流器的 0.6 V 上升到异质结整流器的 2.4 V,在 5 V 固定偏压下,正向电流从 375 nA cm-2 单调下降到 175 nA cm-2。相反,击穿电压随着异质结面积比例的增加而单调上升,从肖特基整流器的 1.2 kV 上升到纯异质结器件的 6.2 kV。击穿主要发生在阳极触点的边缘,但也可能发生在从肖特基触点到氧化镍边缘终端的过渡区域。随着异质结触点面积和直径的相对百分比从 0.2 GW cm-2 增加到 3 GW cm-2,巴利加功勋值也随之增加,而开关期间的能量损失也从 2 W cm-2 增加到 3.9 W cm-2。这些趋势说明了肖特基结和 pn 结在 Ga2O3 整流器工作中的利弊权衡。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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