Kurtis Raymond;Fabrice Retière;Harry Lewis;Andrea Capra;Duncan McCarthy;Austin de St Croix;Giacomo Gallina;Joe McLaughlin;Juliette Martin;Nicolas Massacret;Paolo Agnes;Ryan Underwood;Seraphim Koulosousas;Peter Margetak
{"title":"Stimulated Secondary Emission of Single-Photon Avalanche Diodes","authors":"Kurtis Raymond;Fabrice Retière;Harry Lewis;Andrea Capra;Duncan McCarthy;Austin de St Croix;Giacomo Gallina;Joe McLaughlin;Juliette Martin;Nicolas Massacret;Paolo Agnes;Ryan Underwood;Seraphim Koulosousas;Peter Margetak","doi":"10.1109/TED.2024.3469918","DOIUrl":null,"url":null,"abstract":"Large-area next-generation physics experiments rely on using silicon photomultiplier (SiPM) devices to detect single photons, which trigger charge avalanches. The noise mechanism of external crosstalk occurs when secondary photons produced during a charge avalanche escape from an SiPM and trigger other devices within a detector system. This work presents measured spectra of the secondary photons emitted from the Hamamatsu VUV4 and Fondazione Bruno Kessler (FBK) VUV-HD3 SiPMs stimulated by laser light, near operational voltages. This work describes the microscope for the injection and emission of light (MIEL) setup, which is an experimental apparatus constructed for this purpose. Measurements have been performed at a range of overvoltage values and temperatures from 86 to 293 K. The number of photons produced per avalanche at the source is calculated from the measured spectra and determined to be \n<inline-formula> <tex-math>${49}\\pm {10}$ </tex-math></inline-formula>\n and \n<inline-formula> <tex-math>${61}\\pm {11}$ </tex-math></inline-formula>\n photons produced per avalanche for the VUV4 and VUV-HD3, respectively, at 4-V overvoltage. No significant temperature dependence is observed within the measurement uncertainties. The overall number of photons emitted per avalanche from each SiPM device is also reported.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"71 11","pages":"6871-6879"},"PeriodicalIF":2.9000,"publicationDate":"2024-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10713286/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
Large-area next-generation physics experiments rely on using silicon photomultiplier (SiPM) devices to detect single photons, which trigger charge avalanches. The noise mechanism of external crosstalk occurs when secondary photons produced during a charge avalanche escape from an SiPM and trigger other devices within a detector system. This work presents measured spectra of the secondary photons emitted from the Hamamatsu VUV4 and Fondazione Bruno Kessler (FBK) VUV-HD3 SiPMs stimulated by laser light, near operational voltages. This work describes the microscope for the injection and emission of light (MIEL) setup, which is an experimental apparatus constructed for this purpose. Measurements have been performed at a range of overvoltage values and temperatures from 86 to 293 K. The number of photons produced per avalanche at the source is calculated from the measured spectra and determined to be
${49}\pm {10}$
and
${61}\pm {11}$
photons produced per avalanche for the VUV4 and VUV-HD3, respectively, at 4-V overvoltage. No significant temperature dependence is observed within the measurement uncertainties. The overall number of photons emitted per avalanche from each SiPM device is also reported.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.