{"title":"Schottky Diodes Based on Amorphous Ga2O3 Thin Films by UV-Ozone Treatment","authors":"Limeng Chen;Guangtan Miao;Hongfu Xie;Wenlan Xiao;Guoxia Liu;Fukai Shan","doi":"10.1109/TED.2024.3456772","DOIUrl":null,"url":null,"abstract":"In this report, amorphous Ga2O3 thin film was prepared by magnetron sputtering, and the Schottky barrier diodes (SBDs) based on amorphous Ga2O3 thin films were fabricated. The electrical performances of the SBDs based on amorphous Ga2O3 thin films with different UV-ozone (UVO) treatment conditions were systematically studied. It is found that the oxygen vacancies at the interface of the SBDs can be suppressed by the UVO treatment. The UVO-optimized SBDs exhibit superior electrical performance, including the near-unity ideality factor of 1.12, a Schottky barrier height of 1.05 eV, and a high rectification ratio of \n<inline-formula> <tex-math>$7.08\\times 10^{{8}}$ </tex-math></inline-formula>\n. This method confirms the great potential for SBDs based on amorphous oxide semiconductors (AOSs) in the future.","PeriodicalId":13092,"journal":{"name":"IEEE Transactions on Electron Devices","volume":"71 11","pages":"6910-6914"},"PeriodicalIF":2.9000,"publicationDate":"2024-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Electron Devices","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10691926/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
In this report, amorphous Ga2O3 thin film was prepared by magnetron sputtering, and the Schottky barrier diodes (SBDs) based on amorphous Ga2O3 thin films were fabricated. The electrical performances of the SBDs based on amorphous Ga2O3 thin films with different UV-ozone (UVO) treatment conditions were systematically studied. It is found that the oxygen vacancies at the interface of the SBDs can be suppressed by the UVO treatment. The UVO-optimized SBDs exhibit superior electrical performance, including the near-unity ideality factor of 1.12, a Schottky barrier height of 1.05 eV, and a high rectification ratio of
$7.08\times 10^{{8}}$
. This method confirms the great potential for SBDs based on amorphous oxide semiconductors (AOSs) in the future.
期刊介绍:
IEEE Transactions on Electron Devices publishes original and significant contributions relating to the theory, modeling, design, performance and reliability of electron and ion integrated circuit devices and interconnects, involving insulators, metals, organic materials, micro-plasmas, semiconductors, quantum-effect structures, vacuum devices, and emerging materials with applications in bioelectronics, biomedical electronics, computation, communications, displays, microelectromechanics, imaging, micro-actuators, nanoelectronics, optoelectronics, photovoltaics, power ICs and micro-sensors. Tutorial and review papers on these subjects are also published and occasional special issues appear to present a collection of papers which treat particular areas in more depth and breadth.