Extremely efficient, high beam quality second harmonic generation using a thin-disk regenerative amplifier

IF 4.6 2区物理与天体物理 Q1 OPTICS

Optics and Laser Technology Pub Date : 2024-10-16 DOI:10.1016/j.optlastec.2024.111963

Sizhi Xu , Yubo Gao , Xing Liu , Zuoyuan Ou , Fayyaz Javed , Xingyu He , Haotian Lu , Junzhan Chen , Chunyu Guo , Cangtao Zhou , Qitao Lue , Shuangchen Ruan

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Abstract

We report on a second harmonic generation (SHG) 5.79 ps, 1 MHz green laser system based on a 145 W homemade Yb:YAG picosecond thin-disk regenerative amplifier. To achieve an extremely efficient SHG process, we employed the spatial–temporal nonlinear unidirectional pulse propagation equation (UPE) to optimize the efficiency in high-power picosecond lasers. The lengths of lithium triborate (LBO) crystals, infrared laser intensities, and crystal temperatures were systematically optimized. The resulting 515 nm laser generates an average power of 107.7 W with the highest conversion efficiency of 75 % and a near-diffraction-limited beam quality, with an M² factor of 1.14. To the best of our knowledge, it is the highest conversion efficiency achieved based on a high-power thin-disk laser to date. Furthermore, with the third-harmonic generation at 343 nm, the laser system achieved 65 W of average power and 44.8 % of conversion efficiency.

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使用薄盘再生放大器生成极高效、高光束质量的二次谐波

我们报告了基于 145 W 自制 Yb:YAG 皮秒薄盘再生放大器的 5.79 ps、1 MHz 二次谐波发生 (SHG) 绿激光系统。为了实现极其高效的 SHG 过程，我们采用了时空非线性单向脉冲传播方程 (UPE)，以优化高功率皮秒激光器的效率。我们对三硼酸锂（LBO）晶体的长度、红外激光强度和晶体温度进行了系统优化。最终产生的 515 nm 激光器平均功率为 107.7 W，最高转换效率为 75 %，光束质量接近衍射极限，M2 因子为 1.14。据我们所知，这是迄今为止基于大功率薄盘激光器实现的最高转换效率。此外，利用波长为 343 nm 的三次谐波发生，该激光系统实现了 65 W 的平均功率和 44.8 % 的转换效率。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Optics and Laser Technology 物理-光学

CiteScore

8.50

自引率

10.00%

发文量

1060

审稿时长

3.4 months

期刊介绍： Optics & Laser Technology aims to provide a vehicle for the publication of a broad range of high quality research and review papers in those fields of scientific and engineering research appertaining to the development and application of the technology of optics and lasers. Papers describing original work in these areas are submitted to rigorous refereeing prior to acceptance for publication. The scope of Optics & Laser Technology encompasses, but is not restricted to, the following areas: •development in all types of lasers •developments in optoelectronic devices and photonics •developments in new photonics and optical concepts •developments in conventional optics, optical instruments and components •techniques of optical metrology, including interferometry and optical fibre sensors •LIDAR and other non-contact optical measurement techniques, including optical methods in heat and fluid flow •applications of lasers to materials processing, optical NDT display (including holography) and optical communication •research and development in the field of laser safety including studies of hazards resulting from the applications of lasers (laser safety, hazards of laser fume) •developments in optical computing and optical information processing •developments in new optical materials •developments in new optical characterization methods and techniques •developments in quantum optics •developments in light assisted micro and nanofabrication methods and techniques •developments in nanophotonics and biophotonics •developments in imaging processing and systems